Thermal budget is always a vital element in Si-based superlattice materials processing. In this work, a novel n-type ohmic contacting scheme with a low processing thermal budget is developed by combining the high-dose ion implantation and low-temperature alloying techniques. The optimized specific contact resistivity (ρc) is reduced to 6.18×10-3 Ω·cm² at a low thermal budget of 400 °C, and this is a result of the efficient low-temperature electrical activation in amorphous substances. It is indicated that both the high doping concentration and the formation of NiSi(Ge) alloy phase contribute to the linear ohmic contacting behavior. The ohmic contact resistance dependency on processing temperature is further revealed by a detailed Ni/Si(Ge)-alloying model. A minimum ρc of 2.51×10−4 Ω·cm² is achieved at a thermal budget of 450 °C, which is related to the high bonding intensity at metal/semiconductor interface. Note that this technique is compatible with standard Si-based CMOS process flow, and meanwhile can be applied in high-performance insulated-gate field-effect transistor (IGFET) fabrication. Furthermore, it is verified in our IGFETs that Si/Ge superlattice structures can serve as an efficient potential barrier to constrain electrons.