Abstract; Particle formation has been investigated experimentally from the initial molecular precursors up to the final micron-sized particles in a low pressure silane rf capacitive discharge. Neutrals and ions were studied by quadrupole mass spectrometry in power-modulated plasmas: Whole series of negative ions were observed, ranging from monosilicon anions through to nanometric clusters. Anion confinement results in particles and conversely, anion de-trapping can inhibit particle formation. Plasma polymerisation is considered in terms of neutral and ionic species. Laser light scattering measurements show that particles appear during a rapid coalescence phase and possible mechanisms are discussed.
INTRODUCI'IONParticles during silane plasma processing are a source of contamination [ 11, all the more serious as device areas increase and feature sizes diminish. Despite clean room precautions, however, particles may still ultimately form during the process itself by homogeneous gas-phase nucleation inherent in the plasma chemistry. This is an example of plasma state polymerisation which limits the maximum process rate for particle-free deposition [2]. If formed, micrometric particles are negatively-charged by electron-ion flux equilibration at their surface [3-51 whereupon they are trapped by the plasma sheath potentials and accumulate in electrostatic suspension between the electrodes.It is obvious that macromolecular intermediates must have time to form and grow by successive reactions in the plasma. To eliminate particles, therefore, it suffices to prevent the formation of these particle precursors. The precursors themselves may be neutral or ionic (positive or negative), and the growth reactions may also involve neutrals and/or ions. Different plasma conditions for a given process may favor different polymerisation pathways [a.In low power, low pressure silane plasmas, the appearance of particles after plasma ignition can take many seconds to several minutes [7,8]. Negative ions are retained by the p!asma sheaths, which suggests that plasma polymerisation might proceed via an anionic pathway [3,6,9-121. In this paper, we use quadrupole mass spectrometry of neutrals, cations and anions in a power-modulated rf silane plasma [9] to assess their r6le in particle formation. ON/OFF rf power modulation is necessary to allow the sheath potentials to collapse so that negative ions can diffuse to the electrodes for detection [9,13].
EXPERIMENTALMETHODThe experimental apparatus [9] is a conventional parallel-plate rf capacitive reactor comprising two 13cm-diamelectrodes with a 2.5 cm electrode gap. The gas inlet, in the side wall of the grounded vacuum chamber, was a 30 sccm flow of pure silane at 0.1 mbar reactor pressure. The rf power (-0.03 W cm-3) was ON/OFF modulated at kHz frequencies with an excitation frequency of 10 -30 MHz capadtivelycoupled to the rf electrode via a 1c matching network. The specific plasma parameters are given in each figure caption. Polarisation-sensitive Mie scattering of a laser was used fo...