Study of Modified Offset Trajectory for Bonnet Polishing Based on Lifting Bonnet Method

Abstract

The inability to converge at the edge of a workpiece during polishing affects the edge profile accuracy and surface quality of the workpiece. In this study, a bias trajectory generation method based on the lifting bonnet method that can maintain the morphology of polished edges is presented. Firstly, by establishing the polishing parameters and the decreasing rule in line with the principles of the lifting bonnet method, we obtained the residual height spacing, the radius of the polishing area, the centre offset position, and the pressing depth for each offset trajectory. Subsequently, the modified bias trajectory algorithm correction coefficients were obtained by fitting the edge trajectories using cubic Bessel curves, which were multiplied with the bias amount to obtain the final modified bias trajectory. Finally, an experiment was designed to compare the edge effect of the modified bias trajectory with the traditional grating trajectory. The experimental findings indicate that the reduction in edge collapse following the implementation of the modified offset trajectory was 1.30 μm. In contrast, the edge collapse after polishing with the traditional grating trajectory amounted to 98.67 μm. Moreover, the edge collapse ensuing traditional polishing trajectory was 75.9 times more pronounced than that observed after using the modified offset trajectory. It is shown that the modified bias trajectory method can not only maintain the original edge morphology of the workpiece but can also promote the convergence of the edge effect to a certain extent.