Study on Crystalline Volume Fraction and Activation Energy for Silicon Thin Film Prepared by VHF-PECVD

Abstract

Intrinsic microcrystalline silicon thin film were prepared by VHF-PECVD, the activation energy of thin film were measured by activation energy testing equipment. The activation energy of samples with different crystalline volume fraction were studied. The results showed that: the activation energy of samples deposited at amorphous/microcrystalline transition zone decreases crystalline volume fraction increasing.