Study on fabrication of conductive antimony doped tin oxide thin films (SnO_x:Sb) by 3rd generation mist chemical vapor deposition

Abstract

Transparent conducing antimony doped tin oxide (SnOx:Sb) thin films were fabricated by solution-processed atmospheric-pressure 3rd generation mist chemical vapor deposition (3rd G mist CVD) system with two solution chambers and one mixing chamber to control the atmosphere in reaction area. To study how to reduce the resistivity, the effects of each additive component in dopant solution were investigated; this was followed by identification of components contributing to the fabrication of SnOx:Sb films. Experimentally, the HNO3 clearly affected the resistivity and the formation of SnO2 thin films through a change in the valence state of N derived from HNO3 promoting the transformation of Sn (II) and Sb (III) to Sn (IV) and Sb (V). Moreover, the values of electron and hole effective mass were defined using the specified referred parameters to confirm the band diagram of SnOx:Sb thin films fabricated by 3rd G mist CVD system.

Optoelectronic Properties of Antimony Doped Tin Oxide Thin Films Obtained by Spray Pyrolysis

“…Crystallite size is associated with electrical properties. Lopez-Maldonado et al reported that increasing crystallite size decreases the grain boundaries, decreasing the energy barrier width, which influences the electrical conduction properties 35 . There is no significant difference in FWHM for other diffraction planes.…”

Characterization and study of high conductivity antimony-doped tin oxide thin films grown by mist chemical vapor deposition

“…This precious control of mist ow, which makes mist CVD different from spray and AACVD techniques, is achieved by the following physics: the existence of Leidenfrost state droplets (ELSD) and the low probability of collisions between mist droplets (LPCD). [14][15][16][17][18] As reported in some of the literature, the 2 nd and 3 rd generation mist CVD has been used to fabricate several metal oxide lms. [19][20][21][22][23] Moreover, in contrast to previous research, which improved the lm conductivity by optimizing doping ratio and/or increasing growth temperature, we used several liquid materials to support the fabrication process.…”

“…This precious control of mist flow, which makes mist CVD different from spray and AACVD techniques, is achieved by the following physics: the existence of Leidenfrost state droplets (ELSD) and the low probability of collisions between mist droplets (LPCD). 14–18 As reported in some of the literature, the 2 nd and 3 rd generation mist CVD has been used to fabricate several metal oxide films. 19–23…”

Effect of Aluminum Doping Ratios on the Properties of Aluminum-Doped Zinc Oxide Films Deposited by Mist Chemical Vapor Deposition Method Applying for Photocatalysis

“…However, there are still issues regarding the controlling of surface morphology, growth direction and the cost [31][32][33]. It was reported that mist CVD had advantages on the film deposition such as high uniformity, high reproducibility, simplicity, easy to control, and low cost [34][35][36][37].…”