Study on the spatial resolution of a furfuryl alcohol-negative photoresist using a holographic system

Abstract

A negative photoresist was obtained from furfury alcohol using methylene dichloride as a solvent and trifluoracetic acid as a catalyst. A holographic assembly with a blue laser failed to give interference patterns. However, a periodic interference pattern was printed on a film of furfuryl alcohol resin using an ultraviolet laser with a coherent beam at 360 nm. The period of the pattern was reproduced throughout the film and resulted about 0.46 m. Thus, the resin obtained was able to reach a resolution about 0.23 m.

Use of Poly(furfuryl alcohol) in the Fabrication of Nanostructured Carbons and Nanocomposites

“…[82][83][84][85] Polymeric precursors (PFA or copolymers of FA-phenol) were used to fabricate micropatterns using poly(dimethylsiloxane) (PDMS) molds (Figure 7). [82][83][84][85] Microstructures pyrolyzed at 900 °C became electrically conductive, and they had a conductivity of close to 10 -2 Ω cm. Elementary microelectromechanical functions using the glassy carbon microstructures were thus demonstrated.…”

“…Schueller and others reported the fabrication of free-standing high-carbon microstructures by soft-lithographic techniques for glassy carbon microelectromechanical systems (MEMS). − Polymeric precursors (PFA or copolymers of FA−phenol) were used to fabricate micropatterns using poly(dimethylsiloxane) (PDMS) molds (Figure ). − Microstructures pyrolyzed at 900 °C became electrically conductive, and they had a conductivity of close to 10 -2 Ω cm. Elementary microelectromechanical functions using the glassy carbon microstructures were thus demonstrated …”

The polymerization of furfuryl alcohol with p-toluenesulfonic acid: photocross-linkeable feature of the polymer

“…Films of the adducted polyFa over glass have good performance as photoprinting material [16] and films over silicon produces periodic interference patterns using ultraviolet laser [17] .…”