Substrate Effects on the Speed Limiting Factor of WSe$_2$ Photodetectors

Schedel, Christine; Strauß, Fabian; Kohlschreiber, Pia; Geladari, Olympia; Meixner, Alfred J.; Scheele, Marcus

doi:10.48550/arxiv.2203.14053

Cited by 2 publications

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“…The WSe 2 transition metal dichalcogenide detectors were prepared as reported elsewhere 49 using Scotch tape exfoliation of TMDC flakes onto lithographically fabricated electrodes (WSe 2 : 2 nm Ti/10 nm Au, MoS 2 : 4 nm Ti/20 nm Au, 5 μm × 80 μm, finger width = 10 μm, flake thickness WSe 2 : 30 nm, flake thickness MoS 2 : 110 nm). In contrast, the MoS 2 detectors were fabricated by exfoliating the TMDC first before performing lithography onto the flakes.…”

Section: ■ Introductionmentioning

confidence: 99%

Pitfalls in Determining the Electrical Bandwidth of Nonideal Nanomaterials for Photodetection

2022

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The electrical 3 dB bandwidth is regularly used as a measure for the response speed of a photodetector and is estimated via various approaches in literature, ranging from direct measurements to gauged values via approximations. Great care must be taken when comparing these 3 dB bandwidths, since approximations are only strictly valid for ideal circuits. This paper demonstrates that, for typical photodetectors based on new emerging nanostructured materials, namely quantum dots and transition metal dichalcogenides, the bandwidth can deviate up to 10 3 depending on the chosen approach for the bandwidth specification.

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Section: ■ Introductionmentioning

confidence: 99%

Pitfalls in Determining the Electrical Bandwidth of Nonideal Nanomaterials for Photodetection

2022

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“…Many methods have been used in the search for ultrafast photodetectors based on nanomaterials: chemical doping 10 , heterojunction implementation 11,12 , photonic waveguide integration 13 , and small channel lengths 14,15 , to name a few. In addition, parameters such as the choice of substrate 14,16 , electrode material 8,17,18 , and geometry 19,20 or environment 21 must be considered each time.…”

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Edge Contacts accelerate the Response of MoS2 Photodetectors

Strauß

Schedel

Scheele

2022

Preprint

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We use a facile plasma etching process to define contacts with an embedded edge geometry for multilayer MoS2 photodetectors. Compared to the conventional top contact geometry, the detector response time is accelerated by more than an order of magnitude by this action. We attribute this improvement to the higher in-plane mobility and direct contacting of the individual MoS2 layers in the edge geometry. With this method, we demonstrate electrical 3 dB bandwidths of up to 18 MHz which is one of the highest values reported for pure MoS2 photodetectors. We anticipate that this approach should also be applicable to other layered materials, guiding a way to faster next-generation photodetectors.

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Substrate Effects on the Speed Limiting Factor of WSe$_2$ Photodetectors

Cited by 2 publications

References 0 publications

Pitfalls in Determining the Electrical Bandwidth of Nonideal Nanomaterials for Photodetection

Pitfalls in Determining the Electrical Bandwidth of Nonideal Nanomaterials for Photodetection

Edge Contacts accelerate the Response of MoS2 Photodetectors

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