Surface plasmon lithography beyond the diffraction limit

Wang, ChangTao; Zhao, Zeyu; Gao, Ping; Luo, Yunfei; Luo, Xiangang

doi:10.1360/n972015-01038

Cited by 7 publications

(5 citation statements)

References 56 publications

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“…In CS theory, the reconstruction of sparse signals can be transformed into a problem of minimizing the lp norm (0 ≤ p ≤ 1) under constraint conditions [13]. Common CS reconstruction algorithms include orthogonal matching pursuit method [14], gradient projection sparse reconstruction (GPSR) algorithm [15], alternating direction multiplier method [16], linear Bregman algorithm [17], etc.…”

Section: Optimization Algorithm For Compressed Sensing Sourcementioning

confidence: 99%

Source optimization based on compression sensing for plasmonic lithography

He,

Li,

Ding

et al. 2024

Optical and EUV Nanolithography XXXVII

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Plasmonic lithography can amplify the evanescent wave resonance at the mask and participate in imaging by exciting surface plasmon polaritons (SPPs), breaking the diffraction limit in traditional lithography. Source Optimization (SO) technology is widely used to compensate for imaging distortion in traditional lithography. This paper proposes an effective SO model for plasmonic lithography under the compressed sensing (CS) framework. To accelerate the algorithm, the SO is formulated as an underdetermined linear problem, where the number of equations is much smaller than the source variables. We selected lines, contacts, and complex test patterns to verify the imaging improvements and superiority of the model. The results indicate that compared to the annular sources, optimized sources can achieve better imaging results and higher imaging contrast. This provides favorable conditions for the large-scale application of plasmonic lithography.

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Section: Optimization Algorithm For Compressed Sensing Sourcementioning

confidence: 99%

Source optimization based on compression sensing for plasmonic lithography

He,

Li,

Ding

et al. 2024

Optical and EUV Nanolithography XXXVII

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show abstract

“…In recent years, the so-called surface plasmon polaritons (SPPs) have obtained widespread attention due to their potential in boosting the light-matter interaction, [11][12][13] enhancing the electromagnetic field localization, 5,14 and overcoming the diffraction limit. 15 Therefore, the plasmonic waveguides provide new possibilities in realizing the ultra-compact devices. Many types of plasmonic configurations, such as the V-groove SPPs (V-SPPs) waveguides, 16 dielectric-loaded SPPs (DLSPPs) waveguides, 17,18 metal nanowires, 19,20 and metal-insulator-metal (MIM) waveguides, 21 have been proposed and investigated.…”

Section: Introductionmentioning

confidence: 99%

“…In recent years, the so-called surface plasmon polaritons (SPPs) have obtained widespread attention due to their potential in boosting the light–matter interaction, 11 – 13 enhancing the electromagnetic field localization, 5 , 14 and overcoming the diffraction limit 15 . Therefore, the plasmonic waveguides provide new possibilities in realizing the ultra-compact devices.…”

Section: Introductionmentioning

confidence: 99%

Selectively sorting spin-dependent photons by Y-type plasmonic nanocircuits

Jiang,

Luo,

Zhao

et al. 2024

J. Nanophoton.

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The interaction between the chiral light and matter is vital to construct on-chip multi-functional photonic circuits. The well-known spin-orbit interaction has obtained significant attention in manipulation of light with different circular polarization states. We propose a robust Y-type surface plasmon nano-waveguide structure to effectively sort spin-dependent photons. The optimized simulation results demonstrated that the waveguide modes excited by circularly polarized light with different spin states can be selectively coupled to one of two branching waveguides, with a unidirectionality efficiency up to 0.95. This research may open up new ways for the on-chip implementation of complex photonic functions, nano-photonic circuits, and nano-optical manipulation.

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“…SPL has developed rapidly in recent years, which is considered to be one of the alternative methods to break through the diffraction limit [2]. The feasibility of SPL has been successfully verified [3][4][5][6][7][8].…”

Section: Introductionmentioning

confidence: 99%

“…SPL mainly includes surface plasmon direct-writing lithography, surface plasmon interference lithography and surface plasmon imaging lithography [2]. Surface plasmon direct-writing lithography is the use of sub-wavelength resolution of the focusing spot combined with scanning devices to achieve the processing of nanolithography patterns, but the direct-writing focusing head is required to contact the substrate, which results in damaging to the probe, wearing of the needle tip and scratching of the photoresist.…”

Section: Introductionmentioning

confidence: 99%

Application of double exposure technique in plasmonic lithography

Ding

Dong²,

Chen

et al. 2023

Novel Patterning Technologies 2023

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As the critical dimension (CD) of integrated circuits (ICs) becomes smaller and smaller, traditional optical lithography has a resolution limit due to the light diffraction effect, and surface plasmon lithography (SPL) beyond the diffraction limit developed in recent years is considered to be an alternative method to break through the diffraction limit. However, the fact that transverse magnetic (TM) waves are required to excite surface plasmon polaritons (SPP or SPPs) at the interface between a metal and a dielectric limits the application of surface plasmon lithography in imaging of the two-dimensional patterns in arbitrary shapes into photoresist. As an effective means of expanding existing lithography technology, double exposure (DE) is expected to be an effective means to solve this problem. Taking the advantage of imaging principle of DE, this paper proposes for the first time to apply DE to SPL to improve the imaging quality of SPL and theoretically analyzes the effect of DE on the improvement of SPL patterning in two dimensions. Simulation is performed in commercial software of Comsol Multiphysics 6.0. The simulation result verifies and proves that, in two-dimensional patterning, DE provides better imaging quality than single exposure.

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Surface plasmon lithography beyond the diffraction limit

Cited by 7 publications

References 56 publications

Source optimization based on compression sensing for plasmonic lithography

Source optimization based on compression sensing for plasmonic lithography

Selectively sorting spin-dependent photons by Y-type plasmonic nanocircuits

Application of double exposure technique in plasmonic lithography

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