Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering

Pedersen, Ketill Olav; Bøttiger, J.; Sridharan, M.; Sillassen, Michael; Eklund, Per

doi:10.1016/j.tsf.2010.01.008

Cited by 64 publications

(23 citation statements)

References 42 publications

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“…However, in present work, the Cr/Al ratio of the α-(Cr, Al) 2 O 3 layer in the Cr 2 AlC coating deposited at 370°C is about 2 (see Table 2), exceeds their solid solution greatly, which indicates that the deposited α-(Cr, Al) 2 O 3 is a metastable solid solution. This result is consistent with that obtained by Witthaut et al [41] and Pedersen et al [42]. They found that the non-equilibrium conditions of magnetron sputtering benefit to the formation of metastable α-(Cr, Al) 2 O 3 film.…”

Section: Samplessupporting

confidence: 92%

“…Thus, it is reasonable to expect that the deposition conditions of this Cr-rich α-(Cr, Al) 2 O 3 solid solution is similar to that of pure Cr 2 O 3 , rather than that of pure Al 2 O 3 . Previous investigations [41][42][43][44][45] have demonstrated that although Cr 2 O 3 and Al 2 O 3 have a very similar corundum structure, the deposition conditions of these two binary oxides are completely different. In contrast to α-Al 2 O 3 , which needs high deposition temperature or high energy ion bombardment, Cr 2 O 3 always forms at any conditions.…”

Section: Samplesmentioning

confidence: 99%

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Variation of microstructure and composition of the Cr2AlC coating prepared by sputtering at 370 and 500°C

et al. 2010

Surface and Coatings Technology

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Section: Samplessupporting

confidence: 92%

Section: Samplesmentioning

confidence: 99%

Variation of microstructure and composition of the Cr2AlC coating prepared by sputtering at 370 and 500°C

et al. 2010

Surface and Coatings Technology

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“…It is noteworthy that our films do not form the corundum-structure α-(Al 1-x Cr x ) 2 O 3 solid solution, as would be expected from the literature on this well-studied system [2][3][4][5][6]. It is further remarkable since pure chromia readily grows in the corundum structure also in the present experimental setup, as expected (results not shown).…”

supporting

confidence: 88%

“…Previously, only one type of solid solution is known; the thermodynamically metastable corundum-structure (Al,Cr) 2 O 3 [1][2][3][4][5][6] of the stable binary oxides, α-Al 2 O 3 (corundum) and α-Cr 2 O 3 (eskolaite), which are well-studied in terms of synthesis and characterization [see, e.g, [7][8][9][10]. The only known cubic phase in the archetypical oxide system of alumina is the defect spinelstructure γ-Al 2 O 3 [11,12].…”

mentioning

confidence: 99%

Face-centered cubic (Al1−xCrx)2O3

et al. 2011

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“…α-Cr2O3 being the only crystal structure at this oxygen content for Cr makes it easier to obtain this structure with PVD-techniques. It has been deposited at temperatures of ~480 °C [42] with cathodic arc technique, and with different kind of sputtering techniques from ~60 °C [43] and ~300°C (higher crystallinity) [44,45]. This makes it suitable for stabilizing other compounds in the corundum structure.…”

Section: α-Cr2o3mentioning

confidence: 99%

Thin Film and Plasma Characterization of PVD Oxides

Landälv¹

2017

Linköping Studies in Science and Technology. Dissertations

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The state-of-the-art tools for machining metals are primarily based on a metal-ceramic composite (WC-Co) coated with different combinations of carbide, nitride and oxide coatings. Combinations of these coating materials are optimized to withstand specific wear conditions. Oxide coatings are especially desired because of their possible high hot hardness, chemical inertness with respect to the workpiece, and their low friction.This thesis deals with process and coating characterization of new oxide coatings deposited by physical vapor deposition (PVD) techniques, focusing on the Cr-Zr-O and Al-Cr-Si-O systems.The thermal stability of α-Cr0.28Zr0.10O0.61 deposited by reactive radio frequency (RF)-magnetron sputtering at 500 °C was investigated after annealing up to 870 °C. The annealed samples showed transformation of α-(Cr,Zr)2O3 and amorphous ZrOx-rich areas into tetragonal ZrO2 and bcc Cr. The instability of the α-(Cr,Zr)2O3 is surprising and possibly related to the annealing being done under vacuum, facilitating the loss of oxygen. The stabilization of the room temperature metastable tetragonal ZrO2 phase, due to surface energy effects, may prove to be useful for metal cutting applications. The observed phase segregation of α-(Cr,Zr)2O3 and formation of tetragonal ZrO2 with corresponding increase in hardness for this pseudo-binary oxide system also opens up design routes for pseudo-binary oxides with tunable microstructural and mechanical properties.The inherent difficulties of depositing insulating oxide films with PVD, demanding a closed circuit, makes the investigation of process stability an important part of this research. In this context, we investigated the influence of adding small amount of Si in Al-Cr cathode on plasma characteristics, process parameters, and coating properties. Si was chosen here due to a previous study showing improved erosion behavior of Al-Cr-Si over pure Al-Cr cathode without Si incorporation in the coating.This work shows small improvements in cathode erosion and process stability (lower pressure and cathode voltage) when introducing 5 at % Si in the Al70Cr30-cathode. This also led to fewer droplets at low cathode current and intermediate O2 flow. A larger positive effect on cathode erosion was observed with respect to cleaning the cathode from oxide contamination by increasing cathode current with 50%. However, higher cathode current also resulted in increased amount of droplets in the coating which is undesirable. Through plasma analysis the presence of volatile SiO species could be confirmed but the loss of Si through volatile SiO species was negligible, since the coating composition matched the cathode composition. The positive effect of added Si on the process stability at the cathode surface should be weighed against Si incorporation in the coating. This incorporation may or may not be beneficial for the final application since literature states that Si promotes the metastable γ-phase over the thermodynamically stable α-phase of pure Al2O3, contrary to the effect o...

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Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering

Cited by 64 publications

References 42 publications

Variation of microstructure and composition of the Cr2AlC coating prepared by sputtering at 370 and 500°C

Variation of microstructure and composition of the Cr2AlC coating prepared by sputtering at 370 and 500°C

Face-centered cubic (Al1−xCrx)2O3

Thin Film and Plasma Characterization of PVD Oxides

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