The formation of titanium, chromium, niobium and zirconium aluminides in thin films for interconnections

Ball, Ranadeb; Todd, Audrey

doi:10.1016/0040-6090(87)90390-7

Cited by 31 publications

(3 citation statements)

References 30 publications

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“…2. The formation temperature of the Al 3 Nb compound has been reported to be 400 °C-600 °C, 11,12,14) which is in good agreement with our results.…”

supporting

confidence: 92%

“…In this study, we focused on the Al 3 Nb compound, which is a reaction product of Al and Nb, 11,12) and examined the active use of the Al 3 Nb film at the interface with Al. It has been reported that Al 3 Nb has the largest effective heat of formation among the reactive products of Al and Nb, is the initial phase in the reaction of Al and Nb, and is the final phase.…”

mentioning

confidence: 99%

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Al(111) orientation and thermal stability of the system using Al₃Nb thin film

Takeyama¹,

Satô²

2022

Jpn. J. Appl. Phys.

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We propose the application of aluminide to improve the reliability of LSI metallization and the performance of newly formed devices on it. In this study, the use of the Al3Nb film which is the reaction product at the Al/Nb interface, is effective to improve the thermal stability of Al metallization and to improve the Al (111) orientation. In fact, it has been achieved both the preferential Al(111) orientation and the suppression of the interfacial reaction and interdiffusion of Al and Al3Nb films compared to the case of using the Nb film.

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“…2. The formation temperature of the Al 3 Nb compound has been reported to be 400 °C-600 °C, 11,12,14) which is in good agreement with our results.…”

supporting

confidence: 92%

mentioning

confidence: 99%

Al(111) orientation and thermal stability of the system using Al₃Nb thin film

Takeyama¹,

Satô²

2022

Jpn. J. Appl. Phys.

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“…Methods used for preparation of the coatings include physical vapour deposition, ion implantation, ion beam mixing, controlled heating of multilayers and plasma-enhanced diffusion Drobnig et al, 1996;Miracle, 1993;Massalski et al, 1990;Kattelus et al, 1988;Ma et al, 1989;Krafcsik et al, 1983;Tardy et al, 1985;Ball et al 1987).…”

mentioning

confidence: 99%

EXAFS study of NiAl in thin films

Arčon¹,

Mozetič²,

Kodre³

et al. 2001

J Synchrotron Radiat

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Technologically important coatings of transition-metal aluminides can be produced by thermal or ion beam mixing of multilayer structures sputter deposited on substrates. The quantitative detection of constituents by depth profiling is sufficient to establish the efficiency of mixing methods. However, to decide whether a mixture of nanoparticles or a stoichiometric alloy is formed, EXAFS analysis of the local atomic neighborhood in the film is required. Ni K edge EXAFS spectra are measured on a series of samples of Ni/Al multilayer on Si(111) surface, after ion mixing at different substrate temperatures. The spectra show that with increasing temperature the nickel aluminide phase gradually substitutes the Ni fcc metal phase.

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