The new analysis method of PWQ in the DRAM pattern

Han, Daehan; Chang, Jinman; Kim, Tae-Heon; Lee, Kyu-Sun; Kim, Yonghyeon; Kang, Jinyoung; Hong, Aeran; Choi, Bumjin; Lee, Joosung; Kim, Hyoung Jun; Lee, Kweonjae; Hong, Hye Jin; Jin, Gyoyoung

doi:10.1117/12.2218414

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Hotspot Detection In the Verification Stages Of The Physical Design1

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2022

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“…This method leads to the same hotspot detection result with less computational time. A process window qualification method based on statistical values to find weak points of the pattern increases the accuracy of the process margin and reduces the timing cost [58] . Data mining was performed on a pattern database linked to wafer information [59] .…”

Section: Hotspot Detection In the Verification Stages Of The Physical Designmentioning

confidence: 99%

Advanced process and electron device technology

Zhang¹,

Su²,

Chang³

et al. 2022

Tsinghua Sci. Technol.

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This article reviews advanced process and electron device technology of integrated circuits, including recent featuring progress and potential solutions for future development. In 5 years, for pushing the performance of fin field-effect transistors (FinFET) to its limitations, several processes and device boosters are provided. Then, the three-dimensional (3D) integration schemes with alternative materials and device architectures will pave paths for future technology evolution. Finally, it could be concluded that Moore's law will undoubtedly continue in the next 15 years.

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Section: Hotspot Detection In the Verification Stages Of The Physical Designmentioning

confidence: 99%