The SKIF X-Techno Beamline Project

Abstract

Beamlines nowadays installed at synchrotron radiation centers typically pose different and sometimes even incompatible requirements to X-ray beams being utilized. Some techniques require minimum attainable beam cross-sections in order to enable microbeam techniques with the sample mapping. To the contrary, relatively broad X-ray beams with the uniform intensity distribution are needed to address problems related to X-ray irradiation-based processing of materials or fabrication of components and devices with X-ray lithography approaches. The present paper describes the concept of a novel beamline named X-Techno proposed for the synchrotron radiation facility SKIF. It would use synchrotron beams as wide as 100 mm in the horizontal plane in different spectral ranges with either out of three experimental chambers to study materials and manufacture micro and nanostructures. The beamline will be specifically suitable for studies of physicochemical properties of materials under intense X-ray irradiation within the spectral range from 2 to 70 keV.