2001
DOI: 10.1016/s0925-9635(01)00435-6
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Theoretical analysis of ion bombardment roles in the bias-enhanced nucleation process of CVD diamond

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Cited by 23 publications
(8 citation statements)
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“…In the case of the glow, N 2 can be ionized more completely; meanwhile, the ionization of AlCl 3 and H 2 is further enhanced. So, the quantity of precursors with high chemical activity is increased as the bias induces the glow [15]. Besides, the electrical field originated from the bias can increase the kinetic energy of the ions.…”
Section: Resultsmentioning
confidence: 99%
“…In the case of the glow, N 2 can be ionized more completely; meanwhile, the ionization of AlCl 3 and H 2 is further enhanced. So, the quantity of precursors with high chemical activity is increased as the bias induces the glow [15]. Besides, the electrical field originated from the bias can increase the kinetic energy of the ions.…”
Section: Resultsmentioning
confidence: 99%
“…To remove the damaged layer and produce a clean optic, the piece goes through extensive finishing or polishing. "Polishing is the most timeconsuming and expensive part of the optics process", states Ruckmann [71].…”
Section: Partial Ductile Mode Grindingmentioning
confidence: 99%
“…In the biasing process electrons were emitted from the diamond-coated molybdenum substrate holder and moved to the filament after they gained energy from the electrical field. When the negative bias was applied to the anode the voltage was gradually increased until a stable emission current was established and a luminous glow discharge was formed near the substrate [71]. The nucleation density of diamond has been calculated from the SEM micrographs.…”
Section: Bias-enhanced Nucleation (Ben)mentioning
confidence: 99%
“…However, at a high negative substrate bias voltage, plasma is created in a region above the substrate. The appearance of plasma at this certain high bias voltage should only indicate enhancement of density of diamond nucleation on the substrate [6,8,10,12].…”
Section: Introductionmentioning
confidence: 99%
“…A different bias methodology was followed where the bias voltage was applied to the substrate itself [2,[5][6][7][8][9][10][11][12]. The substrates principally used here were silicon.…”
Section: Introductionmentioning
confidence: 99%