Theory and numerical model of the properties of plasma plume isothermal expansion during nanosecond laser ablation of a bronze-bonded diamond grinding wheel

Research on the mechanism of particle deposit effects and process optimization of nanosecond pulsed laser truing and dressing of materials

“…Table 2 shows the Cu atomic spectral parameters used for calculation. 9 Based on the spectral line intensity and spectral parameters of the Cu atomic line, the Boltzmann plot is presented in Fig. 10.…”

“…Based on the above assumptions and the analysis, in the X -direction, the plasma is produced by a pulsed laser and has pulsating properties, and its expansion space is blocked by the target. The plasma concentration spatial distribution satisfies the Poisson distribution, and the relation is as follows: 9 …”

“…In the experiment, a 1064 nm infrared pulsed laser was used to ablate the material to produce plasma. The literature 9 shows that the absorption of plasma energy during pulsed infrared laser ablation of metal is mainly controlled by an inverse bremsstrahlung absorption effect. The main process is that after absorbing the laser energy in the ion Coulomb field, the free electrons accelerate the motion and transfer the laser energy to atoms or ions, resulting in reionization or secondary ionization.…”

“…Z. Lin et al 7 used the nite-difference time-domain (FDTD) method to study the propagation properties of Gaussian beams in expanded plasma. In order to establish a physical model more consistent with plasma expansion, our research group 8,9 showed that in Cartesian coordinates, plasma expansion exhibits different distribution characteristics during the laser ablation of material, and plasma expansion equations were built. The plasma expansion dimensions, expansion velocity, distribution characteristics and expansion pressure were studied.…”

Research and application of plasma characteristic models for pulsed laser processing of metal materials

“…Mewada et al 7 reported the chemical doping of graphene (grown on silicon using microwave plasma chemical vapour deposition) with carbon dots and revealed an opportunity for growing graphene directly onto silicon substrates with improved mobility using microwave plasma CVD for various electronic applications. In our research group, 5,8,9 the plasma expansion equations were established in Cartesian coordinates, and the plasma characteristics were studied, but the above plasma expansion model has many parameters and the solution procedure is extremely complicated. Therefore, based on the accurate description of the plasma expansion characteristics, it is necessary to reduce the parameter variables in the plasma expansion model and establish a new plasma characteristic model with a simpler structure and more convenient solution for studying the collisional ionization effect.…”