2005
DOI: 10.1016/j.mseb.2004.09.035
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Thin-film technology development for the PowerSphere

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Cited by 9 publications
(8 citation statements)
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“…, where the photo-induced current can be written [9]: (1) where is the photo-induced carrier mobility and L the sample dimensions. In the region of the derivative is linear and equal to so that one can deduce the product.…”
Section: Discussionmentioning
confidence: 99%
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“…, where the photo-induced current can be written [9]: (1) where is the photo-induced carrier mobility and L the sample dimensions. In the region of the derivative is linear and equal to so that one can deduce the product.…”
Section: Discussionmentioning
confidence: 99%
“…1 we show a plot comparing SP for Si based cells as a function of the cell efficiency. This data is taken from a 2005 publication [1]. We note that the lines are extrapolations drawn so as to emphasize that for any chosen efficiency the specific power of thin film cells is superior to that of crystalline cells.…”
Section: Introductionmentioning
confidence: 99%
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“…An option for '3-dimensional deployment' eliminates the need for solar tracking and allows for stronger omnidirectional communications. LISA-T builds upon previously published concepts, such as the PowerSphere [2], Inflatable Torus Solar Array Technology (ITSAT) [3,4], and others [5,6,7,8,9] utilizing new engineering concepts and the latest advancements in thinfilm materials, devices, and deployment options. The project leverages several existing and on-going efforts at Marshall Space Flight Center (MSFC) for design, development, fabrication, and test.…”
Section: Introductionmentioning
confidence: 99%
“…[17] MgF 2 films are also interesting due to their applications to produce multilayers with conducting materials (Ag) [18] suited for protective coatings, electromagnetic shielding, [19] and solar cells. [20] To date, various methods have been used for fabricating MgF 2 thin films, including plasma ion assisted deposition, [21] molecular beam epitaxy (MBE), [22] physical vapor deposition (PVD), [23] ion beam sputtering (IBS), [24] sol-gel, [25] and atomic layer deposition (ALD). [26] ALD presents the benefits of high control of the layer thickness and also high uniformity, excellent step coverage, and high reproducibility.…”
Section: Introductionmentioning
confidence: 99%