2021
DOI: 10.1063/5.0063610
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Time-resolved evolution of plasma parameters in a plasma immersion ion implantation source

Abstract: The origin and nature of perturbations induced by a high-voltage pulse on plasma parameters and their relationship to operating conditions (power and pressure) in an argon inductively coupled radio-frequency plasma device is explored. The plasma parameters are measured with two radiofrequency compensated Langmuir probes positioned either vertically above the pulsing target or horizontally along the diameter of the chamber, in the same axial plane as the target and same distance from the RF antenna. Fluctuation… Show more

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Cited by 5 publications
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