TiO2 coatings via atomic layer deposition on polyurethane and polydimethylsiloxane substrates: Properties and effects on C. albicans growth and inactivation process

Pessoa, Rodrigo Sávio; Santos, Vincent; Cardoso, S.B.; Doria, Anelise C.O.C.; Figueira, Fernanda Ramos; Rodrigues, Bruno V. M.; Testoni, G. E.; Fraga, Mariana Amorim; Marciano, Fernanda Roberta; Lobo, Anderson Oliveira; Maciel, Homero Santiago

doi:10.1016/j.apsusc.2017.05.254

Cited by 48 publications

(36 citation statements)

References 60 publications

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“…In this work, the evaluation of the antibacterial activity of CSTiO 2 with a spherical morphology and nanoscale-thickness of approximately 17 nm was evaluated and compared with traditional TiO 2 NPs. The reduction of thickness of these nanostructures was obtained by reducing the cycles of deposition during the ALD process [18,45–46]. The antibacterial activity of CSTiO 2 and TiO 2 NPs was evaluated by the inhibition of growth of Staphylococcus aureus (control strain ATCC ® 6538TM and resistant strain MRSA 97-7 and MRSA 622-4) and Escherichia coli (control strain ATCC ® 25922TM and resistant strain E. coli 33.1).…”

Section: Resultsmentioning

confidence: 99%

Novel hollow titanium dioxide nanospheres with antimicrobial activity against resistant bacteria

Dicastillo

Patiño

Galotto

et al. 2019

Beilstein J. Nanotechnol.

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The search for and synthesis of new antimicrobial nanostructures is important to reduce microbial incidence that induces infectious diseases and to aid in the antibiotic resistance crisis, which are two of the most pressing issues in global public health. In this work, novel, hollow, calcined titanium dioxide nanospheres (CSTiO2) were successfully synthesized for the first time through the combination of electrospinning and atomic layer deposition techniques. Poly(vinylpyrrolidone) (PVP) electrosprayed spherical particles were double-coated with alumina and titanium dioxide, and after a calcination process, hollow nanospheres were obtained with a radius of approximately 345 nm and shell thickness of 17 nm. The structural characterization was performed using electron microscopy, and X-ray diffraction and small-angle X-ray diffraction evidenced an anatase titanium dioxide crystalline structure. Thermogravimetric analysis and Fourier-transform infrared spectroscopy studies demonstrated the absence of polymer residue after the calcination process. The antimicrobial properties of the developed CSTiO2 hollow nanospheres were evaluated against different bacteria, including resistant E. coli and S. aureus strains, and when compared to commercial TiO2 nanoparticles, CSTiO2 nanospheres exhibited superior performance. In addition, the positive effect of UV irradiation on the antimicrobial activity was demonstrated.

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Section: Resultsmentioning

confidence: 99%

Novel hollow titanium dioxide nanospheres with antimicrobial activity against resistant bacteria

Dicastillo

Patiño

Galotto

et al. 2019

Beilstein J. Nanotechnol.

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“…While for Al 2 O 3 films the cycle times were 0.15, 0.75, 0.15 and 0.75 s for the TMA pulse, purge, H 2 O pulse and another purge, respectively. These are optimal cycle time conditions investigated in early studies [29,30,31,32,33,34]. The vapors of TiCl 4 , TMA and H 2 O were led into the reaction chamber from external reservoirs kept with liquid TiCl 4 (99.95 %, Sigma-Aldrich, São Paulo, Brazil), liquid TMA (97%, Sigma-Aldrich) and deionized water at temperature of 21 °C.…”

Section: Methodsmentioning

confidence: 99%

Atomic Layer Deposited TiO2 and Al2O3 Thin Films as Coatings for Aluminum Food Packaging Application

et al. 2019

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Titanium dioxide (TiO2) and aluminum oxide (Al2O3) coatings have been investigated in a wide range of bio-applications due to their biodegradation and biocompatibility properties, that are key parameters for their use in the food packaging and biomedical devices fields. The present study evaluates and compares the electrochemical behavior of the non-coated, commercial resin-coated, TiO2-coated and Al2O3-coated aluminum in commercial beer electrolyte. For this, TiO2 and Al2O3 thin films were deposited on aluminum (Al) substrates using atomic layer deposition (ALD). The evaluation of the corrosion barrier layer properties was performed by linear sweep voltammetry (LSV) during 10 min and electrochemical impedance spectroscopy (EIS). In addition, profilometry, grazing incidence X-ray diffractometry (GIXRD), scanning electron microscopy (SEM) and Fourier-transform infrared spectroscopy (FT-IR) analyses were performed to investigate the physical and chemical properties of the pristine and / or corroded samples. TiO2 and Al2O3 films presented an amorphous structure, a morphology that follows Al substrate surface, and a thickness of around 100 nm. Analysis of LSV data showed that ALD coatings promoted a considerable increase in corrosion barrier efficiency being 86.3% for TiO2-coated Al and 80% for Al2O3-coated Al in comparison with 7.1% of commercial resin-coated Al. This is mainly due to the lower electrochemical porosity, 11.4% for TiO2-coated Al and 20.4% for Al2O3-coated Al in comparison with 96% of the resin-coated Al, i.e. an increase of up to twofold in the protection of Al when coated with TiO2 compared to Al2O3. The EIS results allow us to complement the discussions about the reduced corrosion barrier efficiency of the Al2O3 film for beer electrolyte once SEM and FT-IR analyzes did not show drastic changes in both investigated ALD films after the corrosion assays. The above results indicate that ALD TiO2 and Al2O3 films may be a viable alternative to replace the synthetic resin coatings frequently used in aluminum cans of use in the food industry.

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“…Titanium dioxide (TiO 2 ) thin films and nanolaminates have a significant number of promising applications in different areas, such as microelectronics [1][2][3][4][5][6], photovoltaics [7,8], photocatalysis [9][10][11] fuel cells [12], sensors [13][14][15][16], anti-reflective coating applications [17], biomedical coatings [18,19] and food packaging applications [20]. The properties and applicability of TiO 2 thin films are intrinsically related to their crystal structure.…”

Section: Introductionmentioning

confidence: 99%

MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion

et al. 2020

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In this paper, we report the plasma-enhanced atomic layer deposition (PEALD) of TiO2 and TiO2/Al2O3 nanolaminate films on p-Si(100) to fabricate metal-oxide-semiconductor (MOS) capacitors. In the PEALD process, we used titanium tetraisopropoxide (TTIP) as a titanium precursor, trimethyl aluminum (TMA) as an aluminum precursor and O2 plasma as an oxidant, keeping the process temperature at 250 °C. The effects of PEALD process parameters, such as RF power, substrate exposure mode (direct or remote plasma exposure) and Al2O3 partial-monolayer insertion (generating a nanolaminate structure) on the physical and chemical properties of the TiO2 films were investigated by Rutherford backscattering spectroscopy (RBS), Raman spectroscopy, grazing incidence X-ray diffraction (GIXRD), and field emission scanning electron microscopy (FESEM) techniques. The MOS capacitor structures were fabricated by evaporation of Al gates through mechanical mask on PEALD TiO2 thin film, followed by evaporation of an Al layer on the back side of the Si substrate. The capacitors were characterized by current density-voltage (J-V), capacitance-voltage (C-V) and conductance-voltage (G-V) measurements. Our results indicate that RF power and exposure mode promoted significant modifications on the characteristics of the PEALD TiO2 films, while the insertion of Al2O3 partial monolayers allows the synthesis of TiO2/Al2O3 nanolaminate with well-spaced crystalline TiO2 grains in an amorphous structure. The electrical characterization of the MOS structures evidenced a significant leakage current in the accumulation region in the PEALD TiO2 films, which could be reduced by the addition of partial-monolayers of Al2O3 in the bulk of TiO2 films or by reducing RF power.

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TiO2 coatings via atomic layer deposition on polyurethane and polydimethylsiloxane substrates: Properties and effects on C. albicans growth and inactivation process

Cited by 48 publications

References 60 publications

Novel hollow titanium dioxide nanospheres with antimicrobial activity against resistant bacteria

Novel hollow titanium dioxide nanospheres with antimicrobial activity against resistant bacteria

Atomic Layer Deposited TiO2 and Al2O3 Thin Films as Coatings for Aluminum Food Packaging Application

MOS Capacitance Measurements for PEALD TiO2 Dielectric Films Grown under Different Conditions and the Impact of Al2O3 Partial-Monolayer Insertion

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