Tip-based nanolithography methods and materials

Krivoshapkina, Yana; Kaestner, Marcus; Rangelow, Ivo W.

doi:10.1016/b978-0-08-100354-1.00015-6

Cited by 11 publications

(10 citation statements)

References 218 publications

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“…SPL creates patterns by scanning a nanometre-sharp tip over the sample to locally induce modifications [4]. In t-SPL, the modification is induced by removing thermal resist with a heated tip.…”

Section: Theorymentioning

confidence: 99%

“…SPL methods are manifold and can be classified by the primary interaction mechanism. For example, some SPL techniques utilise forceinduced interactions, such as mechanical SPL (m-SPL); others use near-field optical techniques; or ink, such as dip-pen nanolithography; or nanoprobe coated with, for example, Pt, Au, Pd as the catalyst to trigger surface reactions [4]. The limitation of most SPL techniques lies in the slow writing speed, which has been overcome by one type of SPL, thermal SPL (t-SPL) [3].…”

Section: Introductionmentioning

confidence: 99%

“…In t-SPL, the tip is heated to trigger the endothermic decomposition of a thermally sensitive resist and evaporation of its monomer to create a pattern in the resist. In addition to the common advantages of SPL, t-SPL is reliable in the relatively high writing speed and the simple mechanism in tip actuation, while still limited in throughput, tip degradation, and the uncertainty in tip-sample contact temperature [3,4]. The applications of t-SPL include the fabrication of room temperature singleelectron transistors based on point-contact tunnel junctions, nanofluidic rocking Brownian motors and single-nanometre master templates for nanoimprint lithography [5,6,7].…”

Section: Introductionmentioning

confidence: 99%

“…In addition, there are other materials being studied and applied in t-SPL. For example, poly(methyl methacrylate) (PMMA), polypropylene carbonate, poly(olefin sulfones), and CSAR 92 have been used as thermal resists under certain conditions [4,8].…”

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Thermal scanning probe lithography using Parylene C as thermal resist

Jiang

Dodds

Dunare

et al. 2022

Micro & Nano Letters

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Thermal scanning probe lithography is a direct-write patterning method that uses a heated scanning probe tip to remove thermal resist. The most widely used thermal resist is polyphthalaldehyde. Another alternative thermal resist, Parylene C is introduced in this letter. It has been found that Parylene C has a wide process latitude as a thermal resist under our experimental conditions. A high resolution of ∼40 nm can be achieved in our optimised process. In addition, patterns in parylene layer can be transferred directly into the substrate with deep reactive ion etching without an additional hard mask, thus simplifying the fabrication process.

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Section: Theorymentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Thermal scanning probe lithography using Parylene C as thermal resist

Jiang

Dodds

Dunare

et al. 2022

Micro & Nano Letters

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“…Nanotechnology has played an important role in reduction of the size of semiconductor devices. Lithography [1][2][3][4][5][6] has been routinely used to produce nanopatterns on semiconductors to fabricate these devices. Scanning Probe Lithography (SPL) is one of the most popular techniques for nanopatterning.…”

Section: Introductionmentioning

confidence: 99%

A study of electronic transport through a nanoscale air film

Sengupta

Anil

Talukder

2020

2020 International Conference on Computer, Electrical &Amp; Communication Engineering (ICCECE)

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This paper presents a simple model for predicting electrical conductivity of air with varying electrode separation and different moisture content present in air. Our system consists of a metallic thin film (Cu) coated sample and a needle tip in a box filled with air. A constant potential difference has been applied between the tip and the sample and electrical current is calculated for different air-gaps and for different humidity conditions using COMSOL Multiphysics software. The electric potential, electric field and current density in the region between the probe tip and sample have been presented. The numerical results showing the variation of terminal current as a function of gap separation and relative humidity are found to be analogous with theoretical prediction. This study will be useful for finding the optimal current in case of electric field induced scanning probe nanolithography techniques such as electrolithography [1].

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