Transient pressure induced by laser ablation of toluene, a highly laser-absorbing liquid

Kawaguchi, Yuji; Ding, Ximing; Narazaki, Aiko; Sato, Tadatake; Niino, Hiroyuki

doi:10.1007/s00339-003-2347-6

Cited by 59 publications

(36 citation statements)

References 36 publications

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“…According to optical images monitored by time-resolved shadowgraph technique, the laser vaporization of toluene liquid showed shockwave propagation and vapour expansion at the interface between silica glass and toluene liquid 15,19,21,22,25,31,33) .…”

Section: Transient Pressure Measurement Of Toluene Vaporizationmentioning

confidence: 99%

Surface Micro-Structuring of Silica Glass by Laser-induced Backside Wet Etching

Niino

Kawaguchi

Sato

et al. 2008

The Review of Laser Engineering

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We have investigated a one-step method to fabricate a microstructure on a silica glass plate by using laser-induced backside wet etching (LIBWE) that consists of excimer laser mask projection system and diode-pumped solid state (DPSS) laser beam scanning system. Well-defined deep microtrenches without crack formations on a fused silica glass plate were fabricated by LIBWE method with the UV lasers. We have demonstrated the microof pits-array and patterned grating on the surface of silica glass plates by LIBWE method at nm and 266 nm with dye solutions. The two new systems allow us to use rapid prototyping high precision surface microfabrication of silica glass as laser direct-write processing.

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Section: Transient Pressure Measurement Of Toluene Vaporizationmentioning

confidence: 99%

Surface Micro-Structuring of Silica Glass by Laser-induced Backside Wet Etching

Niino

Kawaguchi

Sato

et al. 2008

The Review of Laser Engineering

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“…Micro-fabrications of various transparent materials, such as silica glass [9,[12][13][14][15][16][18][19][20][21][22][23][24][25][26][27]29,30,34,35], quartz [10,25,28,[31][32][33], glasses (Pyrex, etc.) [26], calcium fluoride [12,25,32], magnesium fluoride [25], barium fluoride [32], fluorocarbon resin [11], and sapphire [17,25,32,36], have been reported.…”

Section: Introductionmentioning

confidence: 99%

“…[26], calcium fluoride [12,25,32], magnesium fluoride [25], barium fluoride [32], fluorocarbon resin [11], and sapphire [17,25,32,36], have been reported. Furthermore, various dye solutions, such as pyrene/acetone [9,10,12,13,17,18,19,[24][25][26][27][31][32][33], pyrene/tetrahydrofuran (THF) [11,33], pyrene/ tetrachloroethylene [25,26,28,29], pyrene/cyclohexane [25], pyrene/toluene [26][27][28][29][30], pyranine/water [14], naphthalenesulfonic acid/water [15,20,22], naphthalene/methyl methacrylate [34,35], phenolphthalein/N-methyl-2-pyrrolidone [36], and pure toluene [16,21,22,23], have been used in c...…”

Section: Introductionmentioning

confidence: 99%

“…The micro-fabrication is applicable into random-phaseplates [31], Fresnel lens [32], beam-homogenizers (planoconvex microlens array) [33], surface relief gratings [26], imprinting templates [20], and microarrays of dye, protein, and polymer-microbeads [18,19]. By the analyses of timeresolved shadowgraph imaging [15,16,22] and transient pressure measurement [21,23], the dynamics of liquid vaporization was monitored to estimate the initial pressure and propagation rate of vapor bubbles.…”

Section: Introductionmentioning

confidence: 99%

“…The depth of the etch increases linearly with the number of laser shots. Typical etch rates of the material were 0.1-40 nm pulse -1 , depending on irradiation conditions such as laser wavelength, laser fluence, and dye concentrations.Micro-fabrications of various transparent materials, such as silica glass [9,[12][13][14][15][16][18][19][20][21][22][23][24][25][26][27]29,30,34,35], quartz [10,25,28,[31][32][33], glasses (Pyrex, etc.) …”

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confidence: 99%

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Surface microstructures of silica glass by laser-induced backside wet etching

et al. 2008

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Surface micro-structuring of silica glass plates was performed by using laser-induced backside wet etching (LIBWE) upon irradiation with a single-mode laser beam from a diode-pumped solidstate UV laser at 266 nm. We have succeeded in a well-defined micro-pattern formation without debris and microcrack formations around the etched area on the basis of galvanometer-based point scanning system with the laser beam. The behavior of liquid ablation (explosive vaporization) was monitored by impulse pressure detection with a fast-response piezoelectric pressure gauge. LIBWE method is suitable for rapid prototyping and rapid manufacturing of surface microstructuing of silica glass as mask-less exposure system in a conventional atmospheric environment.Keywords: laser ablation, explosive vaporization of liquid, diode-pumped solid state UV laser, single mode laser beam, silica glass, surface micro-structuring IntroductionLaser-induced micro-structuring of various materials has served as an important technique in surface fabrication for optics and optoelectronic devices [1]. In particular, significant attention has been given towards the microstructuring of silica glass in spite of the difficulty involved, since silica is a commonly used material. The use of pulsed lasers can involve several approaches, such as conventional UV laser ablation [2], vacuum UV laser processing [3,4], pulsed-laser-generated x-ray [5], plasmaassisted UV ablation [6,7], and femtosecond laser micromachining [2,8]. We have demonstrated a novel one-step method, laser-induced backside wet etching (LIBWE), for micro-fabrication on a silica glass plate, involving irradiation with nanosecond-pulsed UV lasers . The LIBWE method is based on the deposition of laser energy onto a thin layer at the glass-liquid interface during the explosive vaporization (ablation) of a liquid substance. Assuming negligible UV absorption by the silica glass, the incident laser beam passes through the glass plate resulting in the excitation of the dye solution. When the dye solution close to the interface becomes ablated using laser irradiation with sufficient fluence, etching on a surface layer of the silica glass is achieved. The depth of the etch increases linearly with the number of laser shots. Typical etch rates of the material were 0.1-40 nm pulse -1 , depending on irradiation conditions such as laser wavelength, laser fluence, and dye concentrations.Micro-fabrications of various transparent materials, such as silica glass [9,[12][13][14][15][16][18][19][20][21][22][23][24][25][26][27]29,30,34,35], quartz [10,25,28,[31][32][33], glasses (Pyrex, etc.)

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Hybrid Laser Processing of Transparent Materials

Niino

2010

Laser Precision Microfabrication

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Transient pressure induced by laser ablation of toluene, a highly laser-absorbing liquid

Cited by 59 publications

References 36 publications

Surface Micro-Structuring of Silica Glass by Laser-induced Backside Wet Etching

Surface Micro-Structuring of Silica Glass by Laser-induced Backside Wet Etching

Surface microstructures of silica glass by laser-induced backside wet etching

Hybrid Laser Processing of Transparent Materials

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