Transport and structural properties of silicon films in the amorphous-to-microcrystalline transition region

Abstract

Articles you may be interested inEffect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

GISAXS and ATR-FTIR Studies on Stress-Induced Microstructure Evolution of a-Si:H under H 2 Plasma Exposure

“…Figure 6 demonstrates the results of the ATR-FTIR performed on the as-deposited and H-treated a-Si:H films with different exposure durations. The absorption spectra in the range 1800-2300 cm −1 evidently presents two peaks at 2000 and 2090 cm −1 , attributed to isolated monohydrides (Si-H) and dihydrides (Si-H 2 ) stretching vibrations, [19,20] respectively. The microstructure factor is defined as 𝑅 = 𝐼 2090 /(𝐼 2000 + 𝐼 2090 ) (inset in Fig.…”