2014
DOI: 10.5935/0103-5053.20140041
|View full text |Cite
|
Sign up to set email alerts
|

Tungsten Oxide Thin Films Grown by Thermal Evaporation with High Resistance to Leaching

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

1
1
0

Year Published

2015
2015
2021
2021

Publication Types

Select...
3
1

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(2 citation statements)
references
References 3 publications
1
1
0
Order By: Relevance
“…3 ) show signatures of the W(VI) oxidation state and O 2− , OH − and H 2 O in the hydrated TO (ref. 46 ), further confirming that the electrodeposited films consist of WO 3 ·H 2 O (tungstite). Similar observations were made when molybdenum oxide, which has strong chemical similarity to TO (refs 43 , 47 ), was electrodeposited from alkali solutions 48 .…”
Section: Resultssupporting
confidence: 53%
“…3 ) show signatures of the W(VI) oxidation state and O 2− , OH − and H 2 O in the hydrated TO (ref. 46 ), further confirming that the electrodeposited films consist of WO 3 ·H 2 O (tungstite). Similar observations were made when molybdenum oxide, which has strong chemical similarity to TO (refs 43 , 47 ), was electrodeposited from alkali solutions 48 .…”
Section: Resultssupporting
confidence: 53%
“…XPS peaks at 36.1 and 38.2 eV correspond to W 6+ , while the peaks at 34.7 and 36.8 eV correspond to W 5+ . The spin–orbital doublet splitting of 2.1 eV and an area ratio of 4:3 are characteristic for both ions. Thus, the cumulative chemical formula for the NPs is WO 3– x ·H 2 O with x = 0.03 calculated from the ratio of the XPS peaks.…”
Section: Results and Discussionmentioning
confidence: 99%