Ultra-high purity tungsten and its applications

Yu, Yang; Song, Jiupeng; Bai, Feng Mei; Zheng, Ailong; Peng, Fusheng

doi:10.1016/j.ijrmhm.2015.05.014

Cited by 28 publications

(5 citation statements)

References 4 publications

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“…W is a refractory metal with the highest melting point of 3410 °C compared to those of the others. In addition, it exhibits excellent properties, such as high density, high chemical stability, low vapor pressure, and low coefficients of thermal expansion, which increase its wide applicability [ 1 , 2 , 3 , 4 , 5 ]. Recently, the high-temperature applications of W, such as in fusion reactors and hypersonic vehicles, have received considerable attention.…”

Section: Introductionmentioning

confidence: 99%

Microstructure and High-Temperature Ablation Behaviour of Hafnium-Doped Tungsten-Yttrium Alloys

Huang

Zhang

et al. 2023

Materials

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W is a widely used refractory metal with ultra-high melting point up to 3410 °C. However, its applications are limited by poor ablation resistance under high-temperature flame and air flow, which is crucial for aerospace vehicles. To improve the ablation resistance of W under extreme conditions, W-Y alloys doped with different Hf mass fractions (0, 10, 20, and 30) were prepared using the fast hot pressing sintering method. Microstructure and ablation behaviours at 2000 °C were investigated. Results showed that adding an appropriate amount of Hf improved the properties of the W-Y alloy evidently. In particular, the hardness of the alloy increased with the increased content of Hf. The formation of the HfO2 layer on the surface during ablation decreased the mass and linear ablation rates, indicating enhanced ablation resistance. However, excessive Hf addition will result in crack behaviour during ablation. With a Hf content of 20 wt.%, the alloy exhibited high stability and an excellent ablation resistance.

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Section: Introductionmentioning

confidence: 99%

Microstructure and High-Temperature Ablation Behaviour of Hafnium-Doped Tungsten-Yttrium Alloys

Huang

Zhang

et al. 2023

Materials

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“…Ruthenium, a brittle and hard-to-work metal, presents challenges in achieving high density through severe plastic deformation [2,23,24]. Additionally, ruthenium requires ultra-high purity as a semiconductor sputtering target, which precludes the use of additives such as sintering aids and grain growth inhibitors [2,8,25]. Consequently, ruthenium targets can only be fabricated using the "bottom-up" method.…”

Section: Introductionmentioning

confidence: 99%

Hot-Pressing Deformation Yields Fine-Grained, Highly Dense and (002) Textured Ru Targets

Liu,

Xu,

Zhou

et al. 2023

Materials

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Ruthenium (Ru) is a refractory metal that has applications in the semiconductor industry as a sputtering target material. However, conventional powder metallurgy methods cannot produce dense and fine-grained Ru targets with preferred orientation. Here, we present a novel method of hot-pressing deformation to fabricate Ru targets with high relative density (98.8%), small grain size (~4.4 μm) and strong (002) texture. We demonstrate that applying pressures of 30–40 MPa at 1400 °C transforms cylindrical Ru samples into disk-shaped targets with nearly full densification in the central region. We also show that the hardness and the (002)/(101) peak intensity ratio of the targets increase with the pressure, indicating enhanced mechanical and crystallographic properties. Our study reveals the mechanisms of densification and texture formation of Ru targets by hot-pressing deformation.

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“…Tungsten has the highest melting point in metals. Furthermore, tungsten has many excellent properties, such as high electrical conductivity, high electromigration resistance, high electron emission coefficient, high thermal stability and so on [3].Tungsten is widely used in the manufacture of bite line, gate material [4], diffusion barrier, via and plugs in semiconductor devices [ 5 -6 ] because of these characters. In summary, the manufacturing methods and the performance of tungsten targets are emphasized and have attracted a lot of studies.…”

Section: Introductionmentioning

confidence: 99%

Progresses on Development of Manufacturing Methods of High Purity Tungsten Targets

Ding

2020

MSF

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Tungsten has many excellent properties such as high melting point, high electrical conductivity, high electromigration resistance, high electron emission coefficient, high thermal stability and so on. Because of these excellent properties, high purity tungsten targets have wide applications and development prospects in the integrated circuit (IC) industry. In this paper, some manufacturing methods of tungsten targets was summarized and analyzed. The high melting point of tungsten makes powder metallurgy (PM) be the manufacturing methods of tungsten targets. After preforming of the tungsten powders, some sintering and densification processes like atmosphere pressure sintering, Hot Pressing (HP), Hot Isostatic Pressing(HIP) have been carried out. The grain size and the density of the tungsten targets is different by different manufacturing methods.

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Ultra-high purity tungsten and its applications

Cited by 28 publications

References 4 publications

Microstructure and High-Temperature Ablation Behaviour of Hafnium-Doped Tungsten-Yttrium Alloys

Microstructure and High-Temperature Ablation Behaviour of Hafnium-Doped Tungsten-Yttrium Alloys

Hot-Pressing Deformation Yields Fine-Grained, Highly Dense and (002) Textured Ru Targets

Progresses on Development of Manufacturing Methods of High Purity Tungsten Targets

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