Ultra-thin films with highly absorbent porous media fine-tunable for coloration and enhanced color purity

Yoo, Young Jin; Lim, Jin-Ha; Lee, Gil Ju; Jang, Kyung‐In; Song, Young Min

doi:10.1039/c6nr08475c

Cited by 44 publications

(43 citation statements)

References 24 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…As shown in Fig. 1c, this matching is obtained in a range of 600-700 nm for Ge (in agreement with previous studies [85][86][87]), while the matching is satisfied in wavelength values below 500 nm for PVSK and Fe 2 O 3 [82]. Increasing D S to 25 nm, Ge loses its matching, while Fe 2 O 3 absorption upper edge experiences a red shift (see Fig.…”

Section: Resultssupporting

confidence: 91%

See 1 more Smart Citation

Highly Efficient Semiconductor-Based Metasurface for Photoelectrochemical Water Splitting: Broadband Light Perfect Absorption with Dimensions Smaller than the Diffusion Length

Ghobadi

Karadaş

et al. 2019

Plasmonics

View full text Add to dashboard Cite

In this paper, we demonstrate a highly efficient light trapping design that is made of a metal-oxide-semiconductor-semiconductor (nanograting/nanopatch) (MOSS g/p) four-layer design to absorb light in a broad wavelength regime in dimensions smaller than the hole diffusion length of the active layer. For this aim, we first adopt a modeling approach based on the transfer matrix method (TMM) to find out the absorption bandwidth (BW) limits of a simple hematite (α-Fe 2 O 3)-based metal-oxide-semiconductor (MOS) cavity design. Our modeling findings show that this design architecture can provide near-perfect absorption in shorter wavelengths. To extend the absorption toward longer wavelengths, a nanostructured semiconductor is placed on top of this MOS design. This nanostructure supports the Mie resonance and adds a new resonance in longer wavelengths without disrupting the lower wavelength absorption capability of MOS cavity. By this way, a polarization-insensitive absorption above 0.8 can be acquired up to λ=565 nm. Moreover, to have a better qualitative comparison, the water-splitting photocurrent of this design has been estimated. Our calculations show that a photocurrent as high as 10.6 mA cm −2 can be achieved with this design that is quite close to the theoretical limit of 12.5 mA cm −2 for hematite-based water-splitting photoanode. This paper proposes a design approach in which the superposition of cavity modes and Mie resonances can lead to a broadband, polarization-insensitive, and omnidirectional near-perfect light absorption in dimensions smaller than the carrier's diffusion length. This can be considered as a winning strategy to design highly efficient and ultrathin optoelectronic designs in a variety of applications including photoelectrochemical water splitting and photovoltaics.

show abstract

Section: Resultssupporting

confidence: 91%

“…The strong interface effects, induced by a bottom mirror, can provide light nearly perfect absorption in this design. In this configuration, the right choice of semiconductor geometries can significantly enhance the light-matter interaction [82][83][84][85][86][87]. However, this configuration can enhance light absorption to some extent.…”

Section: Resultsmentioning

confidence: 99%

Highly Efficient Semiconductor-Based Metasurface for Photoelectrochemical Water Splitting: Broadband Light Perfect Absorption with Dimensions Smaller than the Diffusion Length

Ghobadi

Karadaş

et al. 2019

Plasmonics

View full text Add to dashboard Cite

show abstract

“…in optics, biomedicine, sensors, microfluidics, LED fabrication, etc. [1][2][3][4][5][6][7][8]. These films have been classically deposited by the evaporation technique at glancing angles, which allowed the control of different microstructural features such as specific surface, density, pore distribution, pore connectivity, etc.…”

Section: Introductionmentioning

confidence: 99%

Kinetic energy-induced growth regimes of nanocolumnar Ti thin films deposited by evaporation and magnetron sputtering

et al. 2019

View full text Add to dashboard Cite

We experimentally analyze different growth regimes of Ti thin films associated to the existence of kinetic energy-induced relaxation mechanisms in the material's network when operating at oblique geometries. For this purpose, we have deposited different films by evaporation and magnetron sputtering under similar geometrical arrangements and at low temperatures. With the help of a well-established growth model we have found three different growth regimes: i) low energy deposition, exemplified by the evaporation technique, carried out by species with typical energies in the thermal range, where the morphology and density of the film can be explained by solely considering surface shadowing processes, ii) magnetron sputtering under weak plasma conditions, where the film growth is mediated by surface shadowing mechanisms and kinetic-energy relaxation processes, and iii) magnetron sputtering under intense plasma conditions, where the film growth is highly influenced by the plasma, and whose morphology is defined by nanocolumns with similar tilt than evaporated films, but with much higher density. The existence of these three regimes explains the disparity of morphologies of nanocolumnar Ti thin films grown at oblique angles under similar conditions in the literature.

show abstract

“…Nanocolumnar porous thin films deposited at oblique geometries are nowadays receiving much attention due to their unique morphological features and remarkable properties . While their high specific surface can be exploited for the development of gas or liquid sensor devices, the possibility to fine tune their density and connectivity among pores make them also suitable for other applications in technological fields such as biomedicine, plasmonics, microfluidics, batteries, or photonics, among others . In all these cases, the relevant specific features of the nanocolumnar structures (e.g., their size, tilt, average distance, anisotropic distributions, preferential direction of coalescence, etc.)…”

Section: Introductionmentioning

confidence: 99%

Growth of nanocolumnar thin films on patterned substrates at oblique angles

García-Valenzuela

Muñoz‐Piña

Alcalá

et al. 2018

Plasma Processes & Polymers

View full text Add to dashboard Cite

The influence of one dimensional substrate patterns on the nanocolumnar growth of thin films deposited by magnetron sputtering at oblique angles is theoretically and experimentally studied. A well-established growth model has been used to study the interplay between the substrate topography and the thin film morphology. A critical thickness has been defined, below which the columnar growth is modulated by the substrate topography, while for thicknesses above, the impact of substrate features is progressively lost in two stages; first columns grown on taller features take over neighboring ones, and later the film morphology evolves independently of substrate features. These results have been experimentally tested by analyzing the nanocolumnar growth of SiO 2 thin films on ioninduced patterned substrates. K E Y W O R D S magnetron sputtering, nanostructures, oblique angle deposition, patterned substrate, thin films Plasma Process Polym. 2019;16:e1800135.www.plasma-polymers.com

show abstract

Ultra-thin films with highly absorbent porous media fine-tunable for coloration and enhanced color purity

Cited by 44 publications

References 24 publications

Highly Efficient Semiconductor-Based Metasurface for Photoelectrochemical Water Splitting: Broadband Light Perfect Absorption with Dimensions Smaller than the Diffusion Length

Highly Efficient Semiconductor-Based Metasurface for Photoelectrochemical Water Splitting: Broadband Light Perfect Absorption with Dimensions Smaller than the Diffusion Length

Kinetic energy-induced growth regimes of nanocolumnar Ti thin films deposited by evaporation and magnetron sputtering

Growth of nanocolumnar thin films on patterned substrates at oblique angles

Contact Info

Product

Resources

About