Ultrafast magnetization recovery and damping of Pt (Cu) buffered [Co/Ni]6 multilayers with different substrates

Zhang, Linlin; He, Xiaodong; Wang, Jinshan; Tong, Liping; Chen, Siwen; Meng, Weidong; Liu, Zhu; Zhou, Xiaowei; Xi, Li; Zuo, Yalu; Ren, Yang

doi:10.1016/j.jmmm.2024.172343

Journal of Magnetism and Magnetic Materials

2024

DOI: 10.1016/j.jmmm.2024.172343

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Ultrafast magnetization recovery and damping of Pt (Cu) buffered [Co/Ni]6 multilayers with different substrates

Linlin Zhang,

Xiaodong He,

Jinshan Wang

et al.

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2024

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Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]₁₀ thin films

Sarkar,

Hussain,

Rajbanshi

et al. 2024

MetalMat

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A set of [Co(0.2 nm)/Ni(0.4 nm)]10 multilayers (MLs) thin films were fabricated on silicon and glass substrate under various distinct conditions (i) as‐prepared films without an under‐layer, (ii) films with a copper [Cu(2 nm)] underlayer (UL), (iii) films with an in situ annealed Ta/Cu UL during sputtering, and (iv) films with post‐annealing treatment, by using a DC magnetron sputtering machine. The [Co/Ni] MLs thin films prepared under various conditions exhibit in‐plane magnetic anisotropic behavior except as‐prepared films which show isotropic behavior. The maximum saturation magnetization was observed in the as‐prepared films prepared on both silicon and glass substrate. The Ta/Cu UL in situ annealing followed by post‐annealing films exhibit highest coercivity, moderate saturation magnetization but lowest squareness in contrast to the films deposited under other conditions. The I‐V curves of the films show diode like behavior with breakdown voltage of 42, 58, 14, and 21 V for [Co/Ni] MLs under four different conditions.

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Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]₁₀ thin films

Sarkar,

Hussain,

Rajbanshi

et al. 2024

MetalMat

View full text Add to dashboard Cite

show abstract

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Ultrafast magnetization recovery and damping of Pt (Cu) buffered [Co/Ni]6 multilayers with different substrates

Cited by 1 publication

References 48 publications

Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]₁₀ thin films

Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]₁₀ thin films

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Ultrafast magnetization recovery and damping of Pt (Cu) buffered [Co/Ni]6 multilayers with different substrates

Cited by 1 publication

References 48 publications

Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]10 thin films

Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]10 thin films

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Product

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Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]₁₀ thin films

Magnetic properties and I‐V characteristics of DC magnetron sputtered [Co (0.2 nm)/Ni (0.4 nm)]₁₀ thin films