Understanding the electron-stimulated surface reactions of organometallic complexes to enable design of precursors for electron beam-induced deposition

Spencer, Julie A.; Rosenberg, Samantha G.; Barclay, Michael; Wu, Yung-Chien; McElwee‐White, Lisa; Fairbrother, D. Howard

doi:10.1007/s00339-014-8570-5

Cited by 47 publications

(63 citation statements)

References 73 publications

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“…The reactions of W(CO) 6 and Pt(PF 3 ) 4 reflect a sequential, two-step reaction sequence [38,44,45] observed for several FEBID precursors that bear monodentate ligands: precursor decomposition accompanied by ligand desorption [Eq. (1)] followed by decomposition of the remaining ligands [Eq.…”

Section: Prospective Articlementioning

confidence: 99%

“…The organic contamination in FEBID nanostructures is a consequence of the second step of the reaction process, which is characterized by ligand decomposition, where ML n indicates a precursor composed of a metal (M ) and ligands (L), and Z (g) represents volatile fragments desorbed. [45] ML n(abs) + e − ML y(ads)…”

Section: Prospective Articlementioning

confidence: 99%

“…8(b)] have drawn significant interest within the FEBID community, both Au(I) precursors suffer from moisture sensitivity [70,72,73] and thermal instability. [73][74][75] These compounds decompose at relatively low temperatures (RT for L = CO, 40-45°C for L = PF 3 ) [45,74,76] making storage and scale-up problematic for…”

Section: Control Of Precursor Volatility By Ligand Selection: Gold Prmentioning

confidence: 99%

“…(8) and (9). [45] Initially, the adsorbed precursor is exposed to the electrons whereupon the neutral L ligand desorbs from the surface forming gaseous L while an X-Au motif remains adsorbed on the surface. Subsequently, the anionic X ligand is ejected into the gas phase upon further irradiation of the partially decomposed X-Au species, resulting in a pure gold deposit.…”

Section: Prospective Articlementioning

confidence: 99%

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Mechanism-based design of precursors for focused electron beam-induced deposition

et al. 2018

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Section: Prospective Articlementioning

confidence: 99%

Section: Prospective Articlementioning

confidence: 99%

Section: Control Of Precursor Volatility By Ligand Selection: Gold Prmentioning

confidence: 99%

Section: Prospective Articlementioning

confidence: 99%

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Mechanism-based design of precursors for focused electron beam-induced deposition

et al. 2018

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“…Steps forward have been made with the appropriate selection of precursors and writing conditions [31,32], and the rational precursor design for FEBIP receives increasing attention. Experimental work is combined with theoretical calculations [33,34], novel precursors (e.g., for gold deposition) are tested [31], and rational design rules based on fundamental dissociation studies are formulated [35,36].…”

Section: Focused Electron Beam-induced Depositionmentioning

confidence: 99%

Sub-10 nm writing: focused electron beam-induced deposition in perspective

Dorp

2014

Appl. Phys. A

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Over the past decade, focused electron beaminduced deposition has become a mature necessary part of the tool box engineers and scientists. This review presents the current state of the art in sub-10 nm focused electron beam deposition and describes the dominant mechanisms that have been found so far for this regime. Several questions regarding patterning at the highest resolution are addressed. What do our findings mean for using sub-10 nm focused electron beam deposition for industrial applications? And which fundamental issues remain to be solved? The overview shows that low-energy secondary electrons dominate the deposition process. As a result, the highest obtainable spatial resolution (averaged over many deposits) is limited by the mean free path of those electrons. Therefore, the only route to improve the resolution beyond the current appears to be using complexes that are sensitive to the high-energy electrons in the incident beam, rather than to the secondaries. Focused electron beam-induced deposition is compared to related techniques. It is on par with resist-based sub-10 nm electron beam lithography, showing similar spatial resolutions at similar electron doses. Regarding ion beam lithography, there are several distinguishing issues. Sub-10 nm writing has yet to be demonstrated for ion deposition, and although the deposition rate is relatively low when writing with electrons, electrons do not induce damage to the sample. The latter is a crucial advantage for focused electron beam-induced deposition. Finally, the main challenges regarding the applicability of sub-10 nm focused electron beam-induced deposition are discussed.

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ChemInform Abstract: Understanding the Electron‐Stimulated Surface Reactions of Organometallic Complexes to Enable Design of Precursors for Electron Beam‐Induced Deposition

et al. 2014

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Understanding the electron-stimulated surface reactions of organometallic complexes to enable design of precursors for electron beam-induced deposition

Cited by 47 publications

References 73 publications

Mechanism-based design of precursors for focused electron beam-induced deposition

Mechanism-based design of precursors for focused electron beam-induced deposition

Sub-10 nm writing: focused electron beam-induced deposition in perspective

ChemInform Abstract: Understanding the Electron‐Stimulated Surface Reactions of Organometallic Complexes to Enable Design of Precursors for Electron Beam‐Induced Deposition

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