2020
DOI: 10.1109/led.2020.3020857
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Unveiling the Apparent “Negative Capacitance” Effects Resulting From Pulse Measurements of Ferroelectric-Dielectric Bilayer Capacitors

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Cited by 21 publications
(9 citation statements)
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“…Most FE thin films exhibit internal electric fields with unclear origins, and many speculative explanations have been attempted in the literature. Also, all capacitance–voltage ( C – V ) characteristics or hysteresis measurements performed on FE/DE systems manifest typical signs of high internal fields or back-switching phenomenon aspects, which are usually not insisted upon.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Most FE thin films exhibit internal electric fields with unclear origins, and many speculative explanations have been attempted in the literature. Also, all capacitance–voltage ( C – V ) characteristics or hysteresis measurements performed on FE/DE systems manifest typical signs of high internal fields or back-switching phenomenon aspects, which are usually not insisted upon.…”
Section: Resultsmentioning
confidence: 99%
“…Until now, the main focus for new applications was the ability to control the switching dynamic by changing the electrostatic conditions for the ferroelectric element using several methods: deposition on a less conductive substrate (e.g., a semiconductor) by alternating layers with different conductivities and permittivities , or by manufacturing super-lattices. Many published articles are addressing these new applications concerning ferroelectricity obtained in doped HfO 2 , a material that is compatible with Si and is already used in the complementary metal-oxide semiconductor technology, or complex structures with improved characteristics. However, there are a limited number of studies focusing on understanding the complex relationship between polarization switching dynamics in ferroelectrics and external electrostatic conditions.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, the relationship between the displacement field D and the Helmholtz free energy terms h tot , h h , and h ih could be acquired, as shown in Figure 1b, by using δ as a parameter. h DE in Figure 1b was plotted using Equation (11) while assuming that the single DE layer had the same displacement field. The following values were used for effective display of the results: a 1 = − 2.26 × 10 7 V ⋅ m C −1 , a 11 = 1.37 × 10 8 V ⋅ m 5 C −2 , a 111 = 2.76 × 10 9 V ⋅ m 9 C −5 , ε a = 50, ε c = 50, ε d = 8.9, t f = 25 nm, t d = 5 nm, P s = 0.2 C m −2 , and λ = 0.1.…”
Section: Derivation Of the Helmholtz Free Energy Density-displacement...mentioning
confidence: 99%
“…This corresponds to a negative permittivity region when the U-P curve is converted into a polarization-voltage (P-V) curve. This peculiar property of FE materials has generated several novel ideas, [4] including the negative capacitance (NC) effect [5][6][7][8][9][10][11] in DE/FE stacked structures.…”
mentioning
confidence: 99%
“…However, the physical mechanisms for these observations are still not clear. For example, Liu et al have recently proposed an alternative perspective on such experimental observations [23]. Therefore, it is of great importance to further explore the underlying physical mechanisms for such prospective experimental evidence of NC stabilization.…”
Section: Introductionmentioning
confidence: 99%