Versatile r.f. magnetron sputtering doping method to produce aluminum‐doped zinc oxide films

de Oliveira, Gabriel Henrique Inácio; Escote, Márcia T.; Nantes, Iseli L.; Criado, Denise

doi:10.1111/jace.19753

Cited by 2 publications

(1 citation statement)

References 51 publications

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“…Yet, ZnO possesses relatively low conductivity and charge concentration [10]. Introducing Al [11], Cd [12], Ga [13], Mn [14] or In [15] into ZnO film significantly enhances the film's conductivity and overall performance. Previous investigation on Al-doped ZnO (AZO) films demonstrate high transparency across the visible range [16].…”

Section: Introductionmentioning

confidence: 99%

Atomic layer deposition of Al-doped ZnO nanomembrane with in situ monitoring

Wang,

Gu,

Zhao

et al. 2024

Nanotechnology

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Due to shortcomings such as poor homogeneity of Al doping, precisely controlling the thickness, inability to conformally deposit on high aspect ratio devices and high pinhole rate, the applications of Al-doped ZnO (AZO) nanomembrane in integrated optoelectronic devices are remarkably influenced. Here, we report in situ monitoring during the atomic layer deposition (ALD) of AZO nanomembrane by using an integrated spectroscopic ellipsometer. AZO nanomembranes with different compositions were deposited with real-time and precise atomic level monitoring of the deposition process. We specifically investigate the half reaction and thickness evolution during the ALD processes and the influence of the chamber temperature is also disclosed. Structural characterizations demonstrate that the obtained AZO nanomembranes without any post-treatment are uniform, dense and pinhole-free. The transmittances of the nanomembranes in visible range are > 94%, and the optimal conductivity can reach up to 1210 S/cm. The output of current research may pave the way for AZO nanomembrane becoming promising in integrated optoelectronic devices.

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Section: Introductionmentioning

confidence: 99%

Atomic layer deposition of Al-doped ZnO nanomembrane with in situ monitoring

Wang,

Gu,

Zhao

et al. 2024

Nanotechnology

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The Effect of Concentration of Aluminum on Structural, Optical, and Electrical Properties of Aluminum‐doped ZnO Nanostructures Electrochemically Deposited on Polyimide

Çetinel,

Burgaz

2024

ChemistrySelect

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Aluminum‐doped ZnO (AZO) were successfully prepared on polyimide (PI) film using electrochemical deposition. Field emission scanning electron microscopy (FESEM) analysis revealed that as the aluminum concentration increased, the morphology of AZO nanostructures changed from pellets to nanorods. X‐ray photoelectron spectrometry (XPS) was employed to study the chemical states of undoped and Al‐doped ZnO on a polyimide substrate. The X‐ray diffraction (XRD) patterns of the PI/AZO nanostructures showed a polycrystalline wurtzite structure with a crystallographic orientation along the (002) plane. The XRD analysis also indicated that the average crystallite size decreased from 50.5 nm to 31.0 nm with increasing aluminum concentration (from 0.05 mM to 10 mM). Transmittance analysis revealed that with increasing aluminum concentration, the average optical transmittance in the visible region decreased from 90 % to 75 %. The aluminum concentration has a significant effect on the electrical properties of the samples, as shown by current‐voltage (I–V) and Hall measurements. Among the samples, the AZO/PI film prepared with 5 mM aluminum concentration exhibited the minimum electrical resistivity (4.14×10−2 Ω.cm), the highest carrier density (1.10×1021 cm−3) and the Hall mobility (5.40 cm2 V−1 s−1). We also discuss the possible mechanisms underlying these results compared to undoped ZnO films. This study contributes to the potential applications in flexible electronics and optoelectronics by demonstrating the tunability of AZO nanostructures on a flexible polyimide substrate through controlled aluminum doping.

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Versatile r.f. magnetron sputtering doping method to produce aluminum‐doped zinc oxide films

Cited by 2 publications

References 51 publications

Atomic layer deposition of Al-doped ZnO nanomembrane with in situ monitoring

Atomic layer deposition of Al-doped ZnO nanomembrane with in situ monitoring

The Effect of Concentration of Aluminum on Structural, Optical, and Electrical Properties of Aluminum‐doped ZnO Nanostructures Electrochemically Deposited on Polyimide

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