2023
DOI: 10.1038/d41586-023-00026-z
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Vertical architecture improves performance of transistor family

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Cited by 2 publications
(2 citation statements)
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“…Photolithography technique represents the core process for manufacturing electronic devices. It is particularly important for OECT devices, as the active area must be small enough to provide high on/off ratios and fast transient times, yet large enough to allow efficient charge transport [14,90,[134][135][136]. In addition, photolithography provides a cost-effective method of fabricating high-density OECT arrays, making it an ideal candidate for multichannel and nanoscale bioelectronics [85,[137][138][139].…”
Section: Photolithographymentioning
confidence: 99%
“…Photolithography technique represents the core process for manufacturing electronic devices. It is particularly important for OECT devices, as the active area must be small enough to provide high on/off ratios and fast transient times, yet large enough to allow efficient charge transport [14,90,[134][135][136]. In addition, photolithography provides a cost-effective method of fabricating high-density OECT arrays, making it an ideal candidate for multichannel and nanoscale bioelectronics [85,[137][138][139].…”
Section: Photolithographymentioning
confidence: 99%
“…Recent research on IGTs has unveiled a game‐changer neuromorphic device − the ion‐gating vertical transistor (IGVT). [ 32,33 ] Accordingly, Figure 1b also showcases the number of publications focused on neuromorphic applications of vertical transistors, putting forward that research on this new device technology is just getting started. Additionally, Figure 1b indicates that vertical transistors have the potential to become one of the next exponentially rising technologies in the field of neuromorphic science.…”
Section: Introductionmentioning
confidence: 98%