phase-change temperature. In addition, VO 2 also possesses different polymorphisms, including VO 2 (A), [6] VO 2 (B), [7,8] VO 2 (D), [9] VO 2 (M), [10] VO 2 (R), [11] and VO 2 (P). [12] Among them, the VO 2 monoclinic (M) phase is the most attractive due to its MIT behavior at a relatively low temperature of 68 °C. [13] However, the simultaneous creation of polymorphs results in a mixture phase and makes it extremely difficult to achieve a pure VO 2 (M) phase. The MIT temperature of VO 2 (M) can also be further reduced by doping [14] and by varying the particle sizes. [10,12] This makes VO 2 a promising material for many practical applications, including sensors, [15] thermochromic smart windows, [16] field effect transistors, [17] radio-frequency (RF) switches, [18] terahertz nanoantennas, [19] reconfigurable antennas, [20] memory, [21] and energy. [22,23] Due to the exciting applications mentioned above, considerable effort has been devoted to producing VO 2 (M) in the form of a thin film, primarily with a dry vapor process using chemical vapor deposition, [24] sputtering, [25] metalorganic molecular beam epitaxy deposition, [26] pulsed laser deposition, [27,28] e-beam evaporation, [29] and by electric field inducing ions migration. [30] On the other hand, several bulk nanomaterials in solution processes with different shapes and sizes using sol-gel [31] and hydrothermal synthesis [32] are reported. The VO 2 thin-film deposition techniques using dry vapor processes require an ultrahigh level of vacuum conditions (10 â6 Torr) and sometimes very high processing temperatures (400-600 °C). The process also requires expensive masks and nanolithography for device prototyping. However, the solution-based VO 2 preparation processes are the simplest, require lower processing temperatures, and are highly scalable. Among the solution-based processes, hydrothermal synthesis is the most widely adopted technique due to its high-quality and purephase VO 2 nanomaterial production. [5] The only disadvantage of hydrothermal synthesis is the longer reaction time required, up to 2-4 d, to achieve pure VO 2 (M). For practical applications, VO 2 (M) nanostructures must be deposited in the form of films. Spin coating is one technique to realize VO 2 films, but large-area processing and direct patterning are not possible. [31] With the surge in inkjet printing, which is extremely low cost, completely digital, and highly suitable for rapid prototyping or large-scale manufacturing, realizing VO 2 film through inkjet The metal-insulator transition (MIT) phase change of vanadium dioxide (VO 2 ) materials has facilitated many exciting applications. Among the various crystal phases of VO 2 , the monoclinic (M) phase is the only one that demonstrates low-temperature (â68 °C) MIT behavior. However, the synthesis of pure VO 2 (M) is challenging because various polymorphs, such as VO 2 (A), VO 2 (B), and VO 2 (D), are also typically formed during the process. Furthermore, to achieve pure crystalline VO 2 (M) phase, very long reaction times, up...