2008 International Interconnect Technology Conference 2008
DOI: 10.1109/iitc.2008.4546922
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Voltage Ramp and Time-Dependent Dielectric Breakdown in Ultra-Narrow Cu/SiO<inf>2</inf> Interconnects

H. Park
1
,
H.-B. Lee
2
,
Hyung-Mi Jung
3
et al.
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