2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530)
DOI: 10.1109/asmc.2004.1309586
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Wafer current measurement for process monitoring

Abstract: Wafer Current Measurement (WCW is an emerging technique for in-line process monitoring. A Joint development project (JDP) has been conducted by Inftneon (Memory Development Center) and Applied Materials (Process Diagnostics and Control Group). The main goal of this project was development of applications for the WCM technique in Fob environment and spec9cally for state of the arl DRAMInftneon process. A new generation of SEM review tool with integrated FIB (Applied SEWision G2 FIB Defect Analysis system) was u… Show more

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