Wafer shape compensation at the track PEB for improved CD uniformity

Michaelson, Timothy B.; Dai, Jun Yan; Chen, Lu; Cervera, Hiram; Lue, Brian; Herchen, H.; Vellore, Kim; Bekiaris, Nikolaos

doi:10.1117/12.772894

Advances in Resist Materials and Processing Technology XXV 2008

DOI: 10.1117/12.772894

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Wafer shape compensation at the track PEB for improved CD uniformity

Timothy B. Michaelson¹,

Jun Yan Dai²,

Lu Chen³

et al.

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Wafer shape compensation at the track PEB for improved CD uniformity

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