XPS study of siloxane plasma polymer films

Bálková, Radka; Zemek, J.; Čech, Vladimír; Vanek, J.; Přikryl, Radovan

doi:10.1016/s0257-8972(03)00462-6

Cited by 22 publications

(15 citation statements)

References 2 publications

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“…An increase in carbon at the surface has been reported by Balkova et al [47] but they also noted an increase in oxygen at the surface. Our interpretation of the post-plasma reactions must explain the concurrent increase in carbon and decrease in oxygen.…”

Section: Post-plasma Reactionssupporting

confidence: 60%

Influence of Tetramethyldisiloxane‐Oxygen Mixtures on the Physical Properties of Microwave PECVD Coatings and Subsequent Post‐Plasma Reactions

Hall

Murphy

Griesser

2014

Plasma Processes & Polymers

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Coatings deposited by microwave plasma enhanced CVD have potential for applications as protective coatings against mechanical and environmental damage. The properties of plasma polymer coatings can, however, vary markedly with deposition conditions, and we report here that this is also the case for coatings deposited from mixtures of tetramethyldisiloxane (TMDSO) and oxygen. Hardness, modulus, stress, mass, and surface chemical compositions all varied considerably with the TMDSO/O 2 ratio. Post-plasma reactions led to changes in the physical properties of coatings, which were found to be dependent on the oxygen concentration at the time of deposition. Coatings deposited at low oxygen concentration lost mass, became more rigid, became less tensile in stress, and underwent a large increase in hardness and modulus. These coatings were found to craze over periods of up to six months. Coatings deposited at high oxygen concentrations were observed to gain mass, became less rigid, and showed reduced compressive stress. They were more stable but their mechanical mismatch with polymer substrates affects their performance as protective coatings.

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Section: Post-plasma Reactionssupporting

confidence: 60%

Influence of Tetramethyldisiloxane‐Oxygen Mixtures on the Physical Properties of Microwave PECVD Coatings and Subsequent Post‐Plasma Reactions

Hall

Murphy

Griesser

2014

Plasma Processes & Polymers

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“…Depending on the application, different techniques such as Auger electron spectroscopy (AES) [1,2], X-ray photoelectron spectroscopy (XPS) [3,4], secondary ion mass spectrometry (SIMS) [5,6] and glow discharge optical emission spectrometry (GD-OES) and mass spectrometry (GD-MS) [7][8][9][10] are used. Different limitations, such as restriction of sample shape or nature, long time required for analysis, poor lateral resolution and etc.…”

Section: Introductionmentioning

confidence: 99%

Numerical and experimental depth profile analyses of coated and attached layers by laser-induced breakdown spectroscopy

Ardakani

Tavassoli

2010

Spectrochimica Acta Part B: Atomic Spectroscopy

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“…Plasma polymers prepared from organo-silicone monomers are fascinating materials due to the possibility of varying the degree of organic/inorganic character and the degree of cross-linking in the material [4]. Most used monomers in this family of compounds include tetramethylsilane, vinyltrimethylsilane, hexamethyldisiloxane and hexamethyldisilazane containing Si, H, C, O or N atoms [2].…”

Section: Introductionmentioning

confidence: 99%

Preparation and characterization of thin films by plasma polymerization of glycidoxypropyltrimethoxysilane at different plasma powers and exposure times

Sever

Seki

Güleç

et al. 2009

Applied Surface Science

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XPS study of siloxane plasma polymer films

Cited by 22 publications

References 2 publications

Influence of Tetramethyldisiloxane‐Oxygen Mixtures on the Physical Properties of Microwave PECVD Coatings and Subsequent Post‐Plasma Reactions

Influence of Tetramethyldisiloxane‐Oxygen Mixtures on the Physical Properties of Microwave PECVD Coatings and Subsequent Post‐Plasma Reactions

Numerical and experimental depth profile analyses of coated and attached layers by laser-induced breakdown spectroscopy

Preparation and characterization of thin films by plasma polymerization of glycidoxypropyltrimethoxysilane at different plasma powers and exposure times

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