Articles you may be interested inMolecular beam epitaxy of IV-VI mid-infrared vertical cavity surface-emitting quantum well laser structures High reflectivity and broad bandwidth AlN/GaN distributed Bragg reflectors grown by molecular-beam epitaxy Growth and characterization of defect-free GaAs/AlAs distributed Bragg reflector mirrors on patterned InP-based heterostructures J.Bragg reflector structures consisting of BaF 2 /PbEuSe stacks have been epitaxially grown on CaF 2 /Si ͑111͒ substrates. The reflectors are centered at a wavelength of 4.0 m with a bandwidth of about 3.0 m. Reflectivity as high as 95% at the center wavelength has been achieved in three-stack reflectors. Cracks were visible under an optical Normarski microscope in two-stack reflectors. The formation of cracks is probably due to the accumulation of the residual thermal strain in thick layers or the hindrance of dislocation glide at the BaF 2 /PbEuSe interfaces.