1991
DOI: 10.1016/0039-6028(91)90640-e
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XPS study of thin films of titanium oxysulfides

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Cited by 349 publications
(200 citation statements)
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“…Traces of nitrogen and fluorine were present at amounts less than two atomic percents. The oxygen and titanium regional scans showed no difference between the doped and the undoped samples; the O 1s peak, located at 531.0 eV, and D (Ti 2p1/2 À Ti 2p3/2) = 5.7 eV both agreed well with the literature values [35]. The C 1s peak from graphite was present in both samples, as presented in Fig.…”
Section: Characterization Of C-tio 2 Thin Filmsupporting
confidence: 88%
“…Traces of nitrogen and fluorine were present at amounts less than two atomic percents. The oxygen and titanium regional scans showed no difference between the doped and the undoped samples; the O 1s peak, located at 531.0 eV, and D (Ti 2p1/2 À Ti 2p3/2) = 5.7 eV both agreed well with the literature values [35]. The C 1s peak from graphite was present in both samples, as presented in Fig.…”
Section: Characterization Of C-tio 2 Thin Filmsupporting
confidence: 88%
“…The gap between Ti 2p 3/2 and Ti 2p 1/2 is 5 -6 eV, it is ascribed to Ti 4+ (458.9 eV) [17]. The Ti 3+ (456.8 eV) [17] only exists in Au/CuO x -TiO 2 . The intrinsic oxygen vacancy existed in TiO 2 , and Cu added in TiO 2 caused production of extrinsic oxygen vacancy.…”
Section: Xpsmentioning
confidence: 97%
“…From the analysis of the fitting components, the feature C at 453.8 eV can be assigned to the Ti 0 2p 3/2 peak of metallic Ti [38,39] 6.0 eV and the intensity ratio between the components is 1 : 2. These facts agree well with the characteristics of the 2p peak in metallic Ti [38].…”
Section: Hard X-ray Photoelectron Spectroscopy Investigationsmentioning
confidence: 99%