2000
DOI: 10.1016/s0921-4534(00)01291-0
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YBa2Cu3O7 on sputter deposited YSZ buffered Si (100)

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Cited by 4 publications
(2 citation statements)
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“…The layer formed was approximately 15 nm thick and highly oriented with a small amount of in-plane randomness according to the x-ray diffraction data. Exact processing details are discussed in [5], [6].…”
Section: B Fabrication and Processingmentioning
confidence: 99%
See 1 more Smart Citation
“…The layer formed was approximately 15 nm thick and highly oriented with a small amount of in-plane randomness according to the x-ray diffraction data. Exact processing details are discussed in [5], [6].…”
Section: B Fabrication and Processingmentioning
confidence: 99%
“…Historically there has been considerable interest in the use of silicon as a substrate material for high temperature superconductors [1]- [8]. Some of this interest has been motivated by the desire to produce integrated high T C superconductor -semiconductor structures [4], [5]. Other works have cited a desire to use silicon substrates (notably Si on sapphire) for microwave applications [6].…”
Section: Introductionmentioning
confidence: 99%