Zirconium vacuum arc operation in a mixture of Ar and O2 gases: Ar effect on the arcing characteristics, deposition rate and coating properties

Goldberg, Ori; Goldenberg, Eda; Zhitomirsky, V.N.; Cohen, Sidney R.; Boxman, R.L.

doi:10.1016/j.surfcoat.2012.04.082

Cited by 7 publications

(2 citation statements)

References 37 publications

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“…Therefore, the deposition ratio dropped from 92% to 71.2% compared to what is shown in Figure 10f. The decrease in the deposition ratio was explained by Aksenov et al [57], Eriksson et al [58] and Goldberg et al [59], using the reason that collision with background gas limits the ion density towards the substrate. In this study, ions that were affected by elastic collisions would either move into the pipe to deposit, or away from the pipe.…”

Section: Influence Of Ion-neutral Collisionmentioning

confidence: 97%

Simulation of Magnetic-Field-Induced Ion Motion in Vacuum Arc Deposition for Inner Surfaces of Tubular Workpiece

et al. 2020

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A simulation of magnetic-field-induced ion motion in vacuum arc deposition for the inner surfaces of a tubular workpiece was performed. An auxiliary magnetic field was set to guide the motion of ions inside a pipe, with different magnetic flux densities and ion emission parameters. The results showed the trajectories, deposition ratio and depth of the ions can be controlled via a magnetic field. Within a certain range, the deposition ratio of the ions increases with magnetic flux density. When the magnetic flux density reached a certain value, both the trajectories and deposition ratio of the ions exhibited an obvious periodicity. The depth at which the ions were deposited decreased as an exponential function of the magnetic flux density and ion emission radius, respectively. With an increase in the emission angle, the deposition depth decreased linearly. A numerical model was proposed to express the distribution of the deposition depth. In addition, the deposition ratio and depth are improved with a magnetic field in an environment with a certain density of neutral gas.

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Section: Influence Of Ion-neutral Collisionmentioning

confidence: 97%

Simulation of Magnetic-Field-Induced Ion Motion in Vacuum Arc Deposition for Inner Surfaces of Tubular Workpiece

et al. 2020

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“…The typical (a) range of particle energy at the substrate and (b) growth rate for the various PVD methods: thermal evaporation deposition (TED), magnetron sputtering deposition (MSD), pulsed laser deposition (PLD), ion beam deposition (IBD) and cathodic arc deposition (CAD). Based partially on Bundesmann and Neumann (2018), while for the cathodic arc the deposition rate is based on Goldberg et al (2012) and the energy range is based on Anders and Yushkov (2002) and Byon and Anders (2003).…”

Section: Introductionmentioning

confidence: 99%

Foundations of physical vapor deposition with plasma assistance

Guðmundsson

Anders

Keudell

2022

Plasma Sources Sci. Technol.

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Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by physical means, followed by deposition of those atoms on a nearby surface to form a thin film or coating. Various approaches and techniques are applied to release the atoms including thermal evaporation, electron beam evaporation, ion-driven sputtering, laser ablation, and cathodic arc-based emission. Some of the approaches are based on a plasma discharge, while in other cases the atoms composing the vapor are ionized either due to the release of the film-forming species or they are ionized intentionally afterwards. Here, a brief overview of the various PVD techniques is given, while the emphasis is on sputtering, which is dominated by magnetron sputtering, the most widely used technique for deposition of both metallic and compound thin films. The advantages and drawbacks of the various techniques are discussed and compared.

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Consequences of variation in oxygen partial pressure on zirconium oxide thin films

Patel

Chauhan

2022

Materials Today: Proceedings

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Zirconium vacuum arc operation in a mixture of Ar and O2 gases: Ar effect on the arcing characteristics, deposition rate and coating properties

Cited by 7 publications

References 37 publications

Simulation of Magnetic-Field-Induced Ion Motion in Vacuum Arc Deposition for Inner Surfaces of Tubular Workpiece

Simulation of Magnetic-Field-Induced Ion Motion in Vacuum Arc Deposition for Inner Surfaces of Tubular Workpiece

Foundations of physical vapor deposition with plasma assistance

Consequences of variation in oxygen partial pressure on zirconium oxide thin films

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