2010
DOI: 10.1149/ma2010-02/22/1503
|View full text |Cite
|
Sign up to set email alerts
|

(ZrO2)x(La2O3)1-x Alloy as High-k Gate Dielectric for Advanced CMOS Devices

Chin-Yao Hou,
Lun-Lun Chen,
Jia-Rong Wu
et al.

Abstract: not Available.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 6 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?