We demonstrate an aerosol CVD process to dry deposit large-area SWCNT networks with tunable conductivity and optical transmittance on a wide range of substrates including flexible polymers. These SWCNT networks can be chemically doped to reach a sheet resistance of as low as 110 Ω/⟨ at 90% optical transmittance. A wide application potential of these networks is demonstrated by fabricating SWCNT network-based devices such as a transparent capacitive touch sensors, thin-film transistors (TFTs), and bright organic light-emitting diodes (OLEDs).

We report a simple and rapid method to prepare multifunctional free-standing single-walled carbon nanotube (SWCNT) films with variable thicknesses ranging from a submonolayer to a few micrometers having outstanding properties for a broad range of exceptionally performing devices. We have fabricated state-of-the-art key components from the same single component multifunctional SWCNT material for several high-impact application areas: high efficiency nanoparticle filters with a figure of merit of 147 Pa(-1), transparent and conductive electrodes with a sheet resistance of 84 Ω/◻ and a transmittance of 90%, electrochemical sensors with extremely low detection limits below 100 nM, and polymer-free saturable absorbers for ultrafast femtosecond lasers. Furthermore, the films are demonstrated as the main components in gas flowmeters, gas heaters, and transparent thermoacoustic loudspeakers.

Mode-locked sub-picosecond operation of Yb-, Er- and Tm:Hodoped fiber lasers operating at 1.05 microm, 1.56 microm and 1.99 microm, respectively, is demonstrated using the same sample carbon nanotube-based saturable absorber mirror. A mesh of single-walled carbon nanotubes was deposited on an Ag-mirror using a one-step dry-transfer contact press method to combine broadband saturable absorption and high reflectance properties. The novel fabrication method of the polymer-free absorber and device parameters determined using nonlinear reflectivity measurement are described in detail. To our knowledge the observed operation bandwidth of approximately 1 microm is the broadest reported to date for a single carbon nanotube-based saturable absorber.

The sources of non-uniformity in thin films produced using atomic layer deposition (ALD) have been investigated by reviewing the mechanical hardware of ALD reactors, precursors, and the by-products of surface reactions. The most common causes of non-uniformity are overlapping pulses, thermal self-decomposition of precursors, and non-uniform gas distribution. Less studied, however, are the consequences of downstream surface reactions of gaseous by-products. In particular, titanium nitride films have been found to be significantly less uniform than those of transition metal oxides deposited from metal halides. The influence of reaction by-products on the TiN film growth has been studied by comparing the deposition in the cross-flow and showerhead style reactors. Finally, the sources of non-uniformity in plasma enhanced (PE) ALD are illustrated by studying the TiN deposition process.