No abstract

This paper describes composite patterning elements that use a commercially available acryloxy perfluoropolyether (a-PFPE) in various soft lithographic techniques, including microcontact printing, nanotransfer printing, phase-shift optical lithography, proximity field nanopatterning, molecular scale soft nanoimprinting, and solvent assisted micromolding. The a-PFPE material, which is similar to a methacryloxy PFPE (PFPE-DMA) reported recently, offers a combination of high modulus (10.5 MPa), low surface energy (18.5 mNm(-1)), chemical inertness, and resistance to solvent induced swelling that make it useful for producing high fidelity patterns with these soft lithographic methods. The results are comparable to, and in some cases even better than, those obtained with the more widely explored material, high modulus poly(dimethylsiloxane) (h-PDMS).

This article briefly describes two recently developed soft‐lithographic techniques that can be used to fabricate complex, well‐defined three‐dimensional (3D) nanostructures. The first relies on the single or multilayer transfer of thin solid ‘ink' coatings from high‐resolution rubber stamps. The second uses these stamps as conformable phase masks for proximity field nanopatterning of thin layers of transparent photopolymers. Although both techniques use the same pattern‐transfer elements, they rely on completely different physical principles and they provide complementary patterning capabilities. The operational simplicity of the techniques, their ability to pattern large areas quickly, and the flexibility in the geometry of structures that can be formed with them suggest general utility for 3D nanomanufacturing.