We investigated Si-doped GaN epitaxial layers on a (0001)-sapphire substrate using a HCl vapor-phase etching technique, scanning electron microscopy, atomic force microscopy, and transmission electron microscopy. Three kinds of distinctive etch pits correspond to three different types of threading dislocations, edge, mixed, and screw types. Photoluminescence intensity increases with the decrease in the number of etch pits corresponding to mixed and screw dislocations. The number of etch pits corresponding to edge dislocations, however, did not change. We concluded, therefore, that threading dislocations having a screw-component burgers vector act as strong nonradiative centers in GaN epitaxial layers, whereas edge dislocations, which are the majority, do not act as nonradiative centers.

Continuous-wave operation of InGaN green laser diodes (LDs) on semipolar f2021g GaN substrates with output powers of over 100 mW in the spectral region beyond 530 nm is demonstrated. Wall plug efficiencies (WPEs) as high as 7.0-8.9% are realized in the wavelength range of 525-532 nm, which exceed those reported for c-plane LDs. The longest lasing wavelength has reached 536.6 nm under cw operation. These results suggest that the InGaN green LDs on the f20 21g plane are better suited as light sources for applications requiring wavelengths over 525 nm.

The continuous wave operation of a gallium-nitride-based vertical-cavity surface-emitting laser (GaN-based VCSEL) that uses boron ion implantation for lateral current confinement and a curved mirror for lateral optical confinement was investigated. The threshold current was 0.25 mA (Jth = 3.5 kA cm−2) for a 3 μm diameter current aperture at room temperature and the lasing wavelength was 445.3 nm. This is the lowest threshold current recorded for a GaN-based VCSEL. This result is considered to be a milestone for the further miniaturization of GaN-based VCSELs by the implementation of lateral optical confinement due to the incorporation of a curved mirror.

We report our recent progress on GaN-based high-power laser diodes (LDs), which will be applied as a light source in high-density optical storage systems. We have developed raised-pressure metal-organic chemical vapour deposition (RP-MOCVD), which can reduce the threading-dislocation density in the GaN layer to several times 108 cm-2, and demonstrated continuous-wave (cw) operation of GaN-based LD grown by RP-MOCVD. Furthermore, we found that the epitaxial lateral overgrowth (ELO) technique is useful for further reducing threading-dislocation density to 106 cm-2 and reducing the roughness of the cleaved facet. By using this growth technique and optimizing device parameters, the lifetime of LDs was improved to more than 1000 hours under 30 mW cw operation at 60 °C. Our results proved that reducing both threading-dislocation density and consumption power is a valid approach to realizing a practical GaN-based LD. On the other hand, the practical GaN-based LD was obtained when threading-dislocation density in ELO-GaN was only reduced to 106 cm-2, which is a relatively small reduction as compared with threading-dislocation density in GaAs- and InP-based LDs. We believe that the multiplication of non-radiative centres is very slow in GaN-based LDs, possibly due to the innate character of the GaN-based semiconductor itself.

We report single transverse mode operation of a blue GaN-based vertical-cavity surface-emitting laser (GaN-VCSEL) with a monolithically incorporated curved mirror. For a device with a 4 μm current aperture diameter and a curved mirror with a radius of curvature (ROC) of 51 μm, single transverse mode operation was confirmed up to an output power of 3.2 mW under continuous wave operation at 20 °C. For a device with a smaller ROC of 31 μm, multi transverse mode operation was confirmed, indicating that the transverse mode can be controlled by the cavity design of such GaN-VCSELs.