Although the fluorinated graphene (FG) possesses numerous excellent properties, it can not be really applied in aqueous environments due to its high hydrophobicity. Therefore, how to achieve hydrophilic FG is a challenge. Here, a method of solvent-free urea melt synthesis is developed to prepare the hydrophilic urea-modified FG (UFG). Some characterizations via transmission electron microscopy (TEM), atomic force microscopy (AFM), Fourier transfer infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and thermo gravimetric analysis (TGA) demonstrate that the urea molecules can covalently functionalize the FG and the hydrophilic UFG can be prepared. According to the tribological tests run on an optimal-SRV-I reciprocation friction tester, it can be found that the antiwear ability of water can be largely improved by adding the appropriate UFG. When the concentration of UFG aqueous dispersion is 1 mg/mL, the sample of UFG-1 has the best antiwear ability with a 64.4% decrease of wear rate compared with that of the pure water (UFG-0), demonstrating the prepared UFG can be used as a novel and effective water-based lubricant additive.

TiN films with different preferred crystalline orientations have been prepared by a new cathodic arc evaporation technique - filtered arc deposition (FAD). The evolution of the preferred orientation in the TiN films was investigated systematically. Three kinds of preferred orientation, i.e. the (200), (111), and (220) preferred orientation, were achieved continuously in one deposition procedure by varying the film thickness and substrate bias which determines the bombarding energy of the deposited energetic particles. At the initial stage of film growth, the (200) orientation is dominant at a lower substrate bias. When the film becomes thicker and/or substrate bias increases, the preferred orientation will be (111) instead of (200). If the substrate bias increases further, then the preferred (220) growth occurs at any film thickness. The evolution of the preferred orientation from (200) to (111) and then to (220) is discussed on the basis of a new concept, the so-called overall energy which consists of the surface energy, the strain energy, and the stopping energy. The preferred orientation of TiN films is determined by the competition between the surface energy, the strain energy and the stopping energy.

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