The utilization of black phosphorus and its monolayer (phosphorene) and few-layers in field-effect transistors has attracted a lot of attention to this elemental two-dimensional material. Various studies on optimization of black phosphorus field-effect transistors, PN junctions, photodetectors, and other applications have been demonstrated. Although chemical sensing based on black phosphorus devices was theoretically predicted, there is still no experimental verification of such an important study of this material. In this article, we report on chemical sensing of nitrogen dioxide (NO2) using field-effect transistors based on multilayer black phosphorus. Black phosphorus sensors exhibited increased conduction upon NO2 exposure and excellent sensitivity for detection of NO2 down to 5 ppb. Moreover, when the multilayer black phosphorus field-effect transistor was exposed to NO2 concentrations of 5, 10, 20, and 40 ppb, its relative conduction change followed the Langmuir isotherm for molecules adsorbed on a surface. Additionally, on the basis of an exponential conductance change, the rate constants for adsorption and desorption of NO2 on black phosphorus were extracted for different NO2 concentrations, and they were in the range of 130-840 s. These results shed light on important electronic and sensing characteristics of black phosphorus, which can be utilized in future studies and applications.

Semiconducting transition metal dichalcogenides (TMDCs) have attracted a lot of attention recently, because of their interesting electronic, optical, and mechanical properties. Among large numbers of TMDCs, monolayer of tungsten diselenides (WSe2) is of particular interest since it possesses a direct band gap and tunable charge transport behaviors, which make it suitable for a variety of electronic and optoelectronic applications. Direct synthesis of large domains of monolayer WSe2 and their growth mechanism studies are important steps toward applications of WSe2. Here, we report systematical studies on ambient pressure chemical vapor deposition (CVD) growth of monolayer and few layer WSe2 flakes directly on silica substrates. The WSe2 flakes were characterized using optical microscopy, atomic force microscopy, Raman spectroscopy, and photoluminescence spectroscopy. We investigated how growth parameters, with emphases on growth temperatures and durations, affect the sizes, layer numbers, and shapes of as-grown WSe2 flakes. We also demonstrated that transport properties of CVD-grown monolayer WSe2, similar to mechanically exfoliated samples, can be tuned into either p-type or ambipolar electrical behavior, depending on the types of metal contacts. These results deepen our understandings on the vapor phase growth mechanism of WSe2, and may benefit the uses of these CVD-grown monolayer materials in electronic and optoelectronics.

Two-dimensional (2D) materials beyond graphene have drawn a lot of attention recently. Among the large family of 2D materials, transitional metal dichalcogenides (TMDCs), for example, molybdenum disulfides (MoS2) and tungsten diselenides (WSe2), have been demonstrated to be good candidates for advanced electronics, optoelectronics, and other applications. Growth of large single-crystalline domains and continuous films of monolayer TMDCs has been achieved recently. Usually, these TMDC flakes nucleate randomly on substrates, and their orientation cannot be controlled. Nucleation control and orientation control are important steps in 2D material growth, because randomly nucleated and orientated flakes will form grain boundaries when adjacent flakes merge together, and the formation of grain boundaries may degrade mechanical and electrical properties of as-grown materials. The use of single crystalline substrates enables the alignment of as-grown TMDC flakes via a substrate-flake epitaxial interaction, as demonstrated recently. Here we report a step-edge-guided nucleation and growth approach for the aligned growth of 2D WSe2 by a chemical vapor deposition method using C-plane sapphire as substrates. We found that at temperatures above 950 °C the growth is strongly guided by the atomic steps on the sapphire surface, which leads to the aligned growth of WSe2 along the step edges on the sapphire substrate. In addition, such atomic steps facilitate a layer-over-layer overlapping process to form few-layer WSe2 structures, which is different from the classical layer-by-layer mode for thin-film growth. This work introduces an efficient way to achieve oriented growth of 2D WSe2 and adds fresh knowledge on the growth mechanism of WSe2 and potentially other 2D materials.

Two-dimensional (2D) layered tungsten diselenides (WSe2) material has recently drawn a lot of attention due to its unique optoelectronic properties and ambipolar transport behavior. However, direct chemical vapor deposition (CVD) synthesis of 2D WSe2 is not as straightforward as other 2D materials due to the low reactivity between reactants in WSe2 synthesis. In addition, the growth mechanism of WSe2 in such CVD process remains unclear. Here we report the observation of a screw-dislocation-driven (SDD) spiral growth of 2D WSe2 flakes and pyramid-like structures using a sulfur-assisted CVD method. Few-layer and pyramid-like WSe2 flakes instead of monolayer were synthesized by introducing a small amount of sulfur as a reducer to help the selenization of WO3, which is the precursor of tungsten. Clear observations of steps, helical fringes, and herringbone contours under atomic force microscope characterization reveal the existence of screw dislocations in the as-grown WSe2. The generation and propagation mechanisms of screw dislocations during the growth of WSe2 were discussed. Back-gated field-effect transistors were made on these 2D WSe2 materials, which show on/off current ratios of 10(6) and mobility up to 44 cm(2)/(V·s).

Semiconducting single-wall carbon nanotubes are ideal semiconductors for printed electronics due to their advantageous electrical and mechanical properties, intrinsic printability in solution, and desirable stability in air. However, fully printed, large-area, high-performance, and flexible carbon nanotube active-matrix backplanes are still difficult to realize for future displays and sensing applications. Here, we report fully screen-printed active-matrix electrochromic displays employing carbon nanotube thin-film transistors. Our fully printed backplane shows high electrical performance with mobility of 3.92 ± 1.08 cm V s, on-off current ratio I/I ∼ 10, and good uniformity. The printed backplane was then monolithically integrated with an array of printed electrochromic pixels, resulting in an entirely screen-printed active-matrix electrochromic display (AMECD) with good switching characteristics, facile manufacturing, and long-term stability. Overall, our fully screen-printed AMECD is promising for the mass production of large-area and low-cost flexible displays for applications such as disposable tags, medical electronics, and smart home appliances.