GaAs IC Symposium IEEE Gallium Arsenide Integrated Circuit Symposium 17th Annual Technical Digest 1995
DOI: 10.1109/gaas.1995.528972
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0.15 μm InGaAs/AlGaAs/GaAs HEMT production process for high performance and high yield V-band power MMICs

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Cited by 14 publications
(12 citation statements)
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“…The AlGaN/GaN HEMT fabrication process is based on the TRW's mature GaAs and InP HEMT processes designed for high-volume production [7], [8]. Therefore, it typically demonstrates excellent uniformity and reproducibility.…”
Section: Device Structure and Fabricationmentioning
confidence: 99%
“…The AlGaN/GaN HEMT fabrication process is based on the TRW's mature GaAs and InP HEMT processes designed for high-volume production [7], [8]. Therefore, it typically demonstrates excellent uniformity and reproducibility.…”
Section: Device Structure and Fabricationmentioning
confidence: 99%
“…Furthermore, in [7] it was shown that a GB is equivalent to the paraxial field of a point source in complex space.…”
Section: Introductionmentioning
confidence: 98%
“…This paper describes a high-performance downconverting receiver module, based on InP and GaAs MMICs, that has been developed for point-to-point telecommunications links operating in the frequency range of 82-104 GHz. The amplifiers, designed and tested at CSIRO, were made by Northrup Grumman Space Technologies (NGST, formerly TRW) using standard 0.1-m InP HEMT [6] and 0.15-m GaAs pHEMT processes [7]. …”
mentioning
confidence: 99%
“…This paper describes an up-converting transmitter module, based on GaAs MMICs, that has been developed for a point-to-point telecommunications link in the 83-87-GHz band. The amplifiers, designed and tested at CSIRO, were made by Northrup Grumman Space Technologies (NGST, formerly TRW) using a standard 0.15-m GaAs pHEMT process [5]. …”
mentioning
confidence: 99%