1.10 Plasma Membranes

Roualdès, S.; Rouessac, V.

doi:10.1016/b978-0-12-409547-2.12224-3

Cited by 8 publications

(6 citation statements)

References 163 publications

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“…Figure 15 shows measured average ion energy and number of incident atomic oxygen atoms per deposited Si atom when varying the position of the substrate bias, relative areas of Si2p components (as determined by XPS) in the obtained coatings as well as the resulting oxygen transmission rate (OTR) for estimation of barrier performance. The pulsed substrate bias was positioned either in the MW discharge (positions [1]- [5]) or during the MW pause (positions [6]- [10]) while varying the length of the bias. Applying a substrate bias during the MW discharge leads to an increase in the average ion energy per Si atom deposited from 33 to 160 eV while keeping the number of atomic oxygen atoms per Si atom deposited at about 4300.…”

Section: Experimental and Simulation Approaches For The Transfer And ...mentioning

confidence: 99%

PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films

de los Arcos,

Awakowicz,

Böke

et al. 2023

Plasma Processes & Polymers

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This feature article presents insights concerning the correlation of plasma‐enhanced chemical vapor deposition and plasma‐enhanced atomic layer deposition thin film structures with their barrier or membrane properties. While in principle similar precursor gases and processes can be applied, the adjustment of deposition parameters for different polymer substrates can lead to either an effective diffusion barrier or selective permeabilities. In both cases, the understanding of the film growth and the analysis of the pore size distribution and the pore surface chemistry is of utmost importance for the understanding of the related transport properties of small molecules. In this regard, the article presents both concepts of thin film engineering and analytical as well as theoretical approaches leading to a comprehensive description of the state of the art in this field. Perspectives of future relevant research in this area, exploiting the presented correlation of film structure and molecular transport properties, are presented.

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Section: Experimental and Simulation Approaches For The Transfer And ...mentioning

confidence: 99%

PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films

de los Arcos,

Awakowicz,

Böke

et al. 2023

Plasma Processes & Polymers

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“…It allows the fabrication of tailored coatings with regard to mechanical and chemical properties and, at the same time, enables low coating thicknesses in the nanometer range. The formation of organosilica layers by PECVD utilizing hexamethyldisiloxane (HMDSO) as a precursor results in membranes with gas separation characteristics [ 15 , 16 , 17 , 18 , 19 , 20 , 21 , 22 , 23 ]. Inorganic [ 24 , 25 , 26 , 27 ] or organic substrate membranes [ 15 , 21 , 22 , 23 , 28 , 29 , 30 , 31 , 32 , 33 ] function as support for the thin organosilica layer.…”

Section: Introductionmentioning

confidence: 99%

On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

et al. 2022

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Selective, nanometer-thin organosilica layers created by plasma-enhanced chemical vapor deposition (PECVD) exhibit selective gas permeation behavior. Despite their promising pure gas performance, published data with regard to mixed gas behavior are still severely lacking. This study endeavors to close this gap by investigating the pure and mixed gas behavior depending on temperatures from 0 °C to 60 °C for four gases (helium, methane, carbon dioxide, and nitrogen) and water vapor. For the two permanent gases, helium and methane, the studied organosilica membrane shows a substantial increase in selectivity from αHe/CH4 = 9 at 0 °C to αHe/CH4 = 40 at 60 °C for pure as well as mixed gases with helium permeance of up to 300 GPU. In contrast, a condensable gas such as CO2 leads to a decrease in selectivity and an increase in permeance compared to its pure gas performance. When water vapor is present in the feed gas, the organosilica membrane shows even stronger deviations from pure gas behavior with a permeance loss of about 60 % accompanied by an increase in ideal selectivity αHe/CO2 from 8 to 13. All in all, the studied organosilica membrane shows very promising results for mixed gases. Especially for elevated temperatures, there is a high potential for separation by size exclusion.

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“…Multiple studies report the use of plasmapolymeric coatings in the field of gas separation membranes. [ 25–31 ] Coatings are typically deposited on inorganic [ 32–35 ] or on organic substrate membranes. [ 27,36–42 ] Up to now, the influence of PECVD coatings on the aging behavior of the underlying polymer has not been studied.…”

Section: Introductionmentioning

confidence: 99%

Organosilica coating layer prevents aging of a polymer with intrinsic microporosity

Rubner

Stellmann

Mertens

et al. 2022

Plasma Processes & Polymers

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This study tracks the physical aging behavior of coated and uncoated ultra-thin poly(1-trimethylsilyl-1-propyne) (PTMSP) films on silicon wafers based on the refractive index using ellipsometry. The measured refractive index directly correlates with the free volume and hence the physical aging progression. Plasma-enhanced chemical vapor deposition (PECVD) creates coatings with different thicknesses and oxidation degrees onto PTMSP films. Compared to uncoated PTMSP films, the PECVD-coated films show a reduction of the refractive index increase of more than two orders of magnitude for less than 10 nm thin SiOx coatings. In contrast, SiOCH films show only a minor impact. The results reveal the superior physical aging behavior of PECVD-coated films compared to untreated PTMSP films.

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1.10 Plasma Membranes

Cited by 8 publications

References 163 publications

PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films

PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films

On the Mixed Gas Behavior of Organosilica Membranes Fabricated by Plasma-Enhanced Chemical Vapor Deposition (PECVD)

Organosilica coating layer prevents aging of a polymer with intrinsic microporosity

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