In an achievement we believe marks a first, we succeeded in fabricating corrugation gratings in indium‐nitride (InN) films grown by metal organic vapor phase epitaxy (MOVPE) for distributed feedback lasers. The resulting temperature‐independent devices are suitable for wavelength demultiplexing and modulation in optical communications systems. The grating periods are in the first‐order wavelength region of 1.55 μm. We also formed gratings in gallium nitride epitaxial layers, applying electron‐beam (EB) lithography to form grating patterns in nitride substrates and inductively‐coupled plasma reactive ion etching (ICP‐RIE) to transfer EB resist patterns to nitrides. The depth of the grating grooves can be controlled by adjusting ICP‐RIE etching times to attain suitable coupling coefficients for forward and backward propagating waves in DFB lasers. We also introduce UV imprinting, a new grating fabrication technique that offers significant promise. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)