2007
DOI: 10.1134/s1064226907060150
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1/f noise in metal insulator semiconductor transistors with different conductivity types and different topological dimensions of the channel

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Cited by 2 publications
(5 citation statements)
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“…The predominant sources of noise in graphene devices are a combination of local fluctuations in the charge carrier density [37], local fluctuations in the carrier mobility [38] and contact resistance [39]. In dark, we observe at each bias a 1/f trend of S I , which corresponds to Flicker noise, and it is the typical type of noise observed in graphene-based devices [40], as well as in other 3-D material systems [41,42] such as metal-insulatorsemiconductor transistors [43] and photodetectors [44]. Specifically, Ref.37 attributed the origin of Flicker noise in graphene to the random trapping/de-trapping of charge carriers at the interface with the oxide supporting the graphene layer, which ultimately affects transport across the material.…”
Section: Resultsmentioning
confidence: 73%
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“…The predominant sources of noise in graphene devices are a combination of local fluctuations in the charge carrier density [37], local fluctuations in the carrier mobility [38] and contact resistance [39]. In dark, we observe at each bias a 1/f trend of S I , which corresponds to Flicker noise, and it is the typical type of noise observed in graphene-based devices [40], as well as in other 3-D material systems [41,42] such as metal-insulatorsemiconductor transistors [43] and photodetectors [44]. Specifically, Ref.37 attributed the origin of Flicker noise in graphene to the random trapping/de-trapping of charge carriers at the interface with the oxide supporting the graphene layer, which ultimately affects transport across the material.…”
Section: Resultsmentioning
confidence: 73%
“…Specifically, Ref.37 attributed the origin of Flicker noise in graphene to the random trapping/de-trapping of charge carriers at the interface with the oxide supporting the graphene layer, which ultimately affects transport across the material. In 3-D metal-insulatorsemiconductor structures, noise is also originated from the charge trapping in the insulating layer, influencing electronic transport [43,44]. These mechanisms explain the overall 1/f trend observed in Fig.…”
Section: Resultsmentioning
confidence: 87%
“…In 3-D metal−insulator−semiconductor structures, noise also originates from the charge trapping in the insulating layer, influencing electronic transport. 52,53 These mechanisms explain the overall 1/f trend observed in Figure 5a. At frequencies >40 Hz, we start detecting the 50 Hz main hum and its harmonics, which explains the peaks in the figure . A larger bias causes S I to rise accordingly, which is typical of flicker noise in electronic devices where S I is proportional to the average squared direct current I 2 measured at the respective bias.…”
Section: Resultsmentioning
confidence: 77%
“…14 The predominant sources of noise in graphene devices are a combination of local fluctuations in the charge carrier density, 46 local fluctuations in the carrier mobility, 47 and contact resistance. 48 In the dark, we observe at each bias a 1/f trend of S I , which corresponds to flicker noise, and it is the typical type of noise observed in graphene-based devices 49 as well as in other 3-D material systems 50,51 such as metal− insulator−semiconductor transistors 52 and photodetectors. 53 Specifically, ref 46 attributed the origin of flicker noise in graphene to the random trapping/detrapping of charge carriers at the interface, with the oxide supporting the graphene layer, which ultimately affects transport across the material.…”
Section: Resultsmentioning
confidence: 87%
See 1 more Smart Citation