2014
DOI: 10.4028/www.scientific.net/msf.778-780.855
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13-kV, 20-A 4H-SiC PiN Diodes for Power System Applications

Abstract: We successfully fabricated 13-kV, 20-A, 8 mm × 8 mm, drift-free 4H-SiC PiN diodes. The fabricated diodes exhibited breakdown voltages that exceeded 13 kV, a forward voltage drop of 4.9–5.3 V, and an on-resistance (RonAactive) of 12 mW·cm2. The blocking yield at 10 kV on a 3-in wafer exceeded 90%. We investigated failed devices using Candela defect maps and light-emission images and found that a few devices failed because of large defects on the chip. We also demonstrated that the fabricated diodes can be used … Show more

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Cited by 9 publications
(3 citation statements)
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“…Figure 1 shows the forward characteristics of an SiC-PiN diode. R diff,on = 12 mΩ cm 2 , and there is forward current higher than 20 A at the voltage of 5 V. The blocking voltage of the fabricated SiC-PiN diode was 13.7 kV [3]. Figure 2 shows the temperature dependence of the reverse recovery characteristics measured using the package technology that will be described in section IV.…”
Section: Sic Pin Diodementioning
confidence: 98%
“…Figure 1 shows the forward characteristics of an SiC-PiN diode. R diff,on = 12 mΩ cm 2 , and there is forward current higher than 20 A at the voltage of 5 V. The blocking voltage of the fabricated SiC-PiN diode was 13.7 kV [3]. Figure 2 shows the temperature dependence of the reverse recovery characteristics measured using the package technology that will be described in section IV.…”
Section: Sic Pin Diodementioning
confidence: 98%
“…A double pulse test was conducted to measure reverse recovery characteristics of both the fabricated SiC JBS diode and a previously reported [7] 13-kV SiC PiN diode. Figure 7 shows an Table 1.…”
Section: Reverse Recovery Characteristicsmentioning
confidence: 99%
“…Epitaxial layers grown by chemical vapor deposition (CVD) on commercial 4H-SiC substrates were used as starting material for implanted p+-n−-n+ merged pn-Schottky (MPS) diodes, together with additional test structures. [3] The epitaxial structure view and thickness map of a 4H-SiC epitaxial wafer of 1200V 40A SBD are shown in Fig. 1.…”
Section: Design and Experimentalmentioning
confidence: 99%