2011
DOI: 10.1364/oe.19.011381
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13-μm InAs/GaAs quantum-dot lasers monolithically grown on Si substrates

Abstract: We report the first operation of an electrically pumped 1.3-μm InAs/GaAs quantum-dot laser epitaxially grown on a Si (100) substrate. The laser structure was grown directly on the Si substrate by molecular beam epitaxy. Lasing at 1.302 μm has been demonstrated with threshold current density of 725 A/cm2 and output power of ~26 mW for broad-area lasers with as-cleaved facets at room temperature. These results are directly attributable to the optimized growth temperature of the initial GaAs nucleation layer.

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Cited by 248 publications
(115 citation statements)
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“…From the plan-view image of Fig. 1(a), the morphology of the unburied QD can easily be defined at the atomic scale, analyzing angles of reconstructed facets with the nominal (001) plan, and QD edge direction angles with the [1][2][3][4][5][6][7][8][9][10] and [110] directions that is fixed by the dimer orientation on the (001) nominal surface [the wetting layer (WL), here]. Resulting geometry and crystallographic orientations are illustrated in Fig.…”
Section: Qd Geometry and Compositionmentioning
confidence: 99%
See 1 more Smart Citation
“…From the plan-view image of Fig. 1(a), the morphology of the unburied QD can easily be defined at the atomic scale, analyzing angles of reconstructed facets with the nominal (001) plan, and QD edge direction angles with the [1][2][3][4][5][6][7][8][9][10] and [110] directions that is fixed by the dimer orientation on the (001) nominal surface [the wetting layer (WL), here]. Resulting geometry and crystallographic orientations are illustrated in Fig.…”
Section: Qd Geometry and Compositionmentioning
confidence: 99%
“…Especially, the hybrid integration of III-V structures by bonding [2] or epitaxial lift-off and transfer-printing [3] are considered as very potent short-term solutions to address the medium volume applications of high-bandwidth data transmissions in servers and data centers. On a longer term, the monolithic integration of III-V semiconductors lasers on silicon is expected to match more surely with the very large scale integration requirements [4][5][6]. Unfortunately, crystalline defects generated during the III-V/Si heteroepitaxy are known to limit the laser device performances; a thick buffer layer is usually needed to avoid the emergence of these structural defects, which limits the optical coupling solutions with the silicon chip.…”
Section: Introductionmentioning
confidence: 99%
“…N recent years silicon photonics as an integration platform has been a focus of optoelectronics research because of promise of low-cost, high-volume, manufacturing in silicon allowing for economical optical interconnects in applications [1]- [2]. Optical interconnects to and on silicon-on-insulator (SOI) substrates are now being considered as a promising candidate to overcome the limitations of electrical interconnects [3].…”
Section: Introductionmentioning
confidence: 99%
“…Many approaches have been investigated; including rare earth doped Si, stimulated Raman scattering, nanostructure Si and heterogeneous/monolithic integration of III-V and Si [2][3][4][5][6]. Several successful demonstrations of room temperature lasing have been reported including Si Raman lasers, hybrid Si lasers and III-V and Ge lasers grown on Si [3,4]. However, each of these methods still requires significant development in order to provide a manufacturable solution.…”
Section: Introductionmentioning
confidence: 99%