2019 IEEE International Electron Devices Meeting (IEDM) 2019
DOI: 10.1109/iedm19573.2019.8993567
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14nm FinFET process technology platform for over 100M pixel density and ultra low power 3D Stack CMOS Image Sensor

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Cited by 5 publications
(2 citation statements)
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“…This is because the semiconductor fabrication technology, quantified by the process node, of the sensor usually lags at least one generation behind that of the processor. Today, many commercial processors are fabricated using a 7 nm process node or smaller, but even high-end image sensors still use a 14 nm or 28 nm process node [58,87]. The computation power consumption increases quadratically with respect to the process node [25].…”
Section: Reducing Sensor Data Transmissionmentioning
confidence: 99%
“…This is because the semiconductor fabrication technology, quantified by the process node, of the sensor usually lags at least one generation behind that of the processor. Today, many commercial processors are fabricated using a 7 nm process node or smaller, but even high-end image sensors still use a 14 nm or 28 nm process node [58,87]. The computation power consumption increases quadratically with respect to the process node [25].…”
Section: Reducing Sensor Data Transmissionmentioning
confidence: 99%
“…Samsung has moved toward 0.7 lm pixel on 65 nm technology with logic and signal processor on 14 nm FinFET technology recently. The 144 MP BSI-CIS using 14 nm technology for logic chip gains 42% power consumption reduction over logic chip processed by 28 nm [10]. A 12 MP dual photodiode (2PD) BSI-CIS is explored in the 65 nm-14 nm processing technology and gains 29% power consumption reduction over that processed by 65 nm-28 nm technologies.…”
Section: The Stacked Rgb Backside Illuminated-cmos Imagementioning
confidence: 99%